美国光学学会2010年光学干涉涂层专题会议：特邀编辑引言

Optical Society of America's 2010 Topical Meeting on Optical Interference Coatings: introduction by the feature editors.

作者信息

Stolz Christopher J, Tilsch Markus K, Ristau Detlev

机构信息

Lawrence Livermore National Laboratory, Livermore, California 94551, USA.

出版信息

Appl Opt. 2011 Mar 20;50(9):OIC1-2. doi: 10.1364/AO.50.00OIC1.

DOI:10.1364/AO.50.00OIC1

PMID:21460990

Abstract

This Applied Optics feature issue is dedicated to the eleventh topical meeting on Optical Interference Coatings held on 6-11 June 2010 in Tucson, Arizona, USA. This topical conference is held in a three year rotation with conferences in Europe and Asia and is a premier opportunity to discuss advances in research and development within the field of optical interference coatings. Papers from this meeting cover a broad range of topics ranging from deposition processes, thin film design, materials, metrology, and a wide array of practical applications.

摘要

本期《应用光学》专题特刊致力于介绍2010年6月6日至11日在美国亚利桑那州图森市举行的第十一届光学干涉涂层专题会议。该专题会议每三年举办一次，分别在欧洲、亚洲和美国轮流举行，是讨论光学干涉涂层领域研发进展的重要契机。本次会议的论文涵盖了广泛的主题，包括沉积工艺、薄膜设计、材料、计量学以及众多实际应用。