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硅纳米线阵列在紫外光照射下诱导氧化石墨烯还原。

Silicon nanowire arrays-induced graphene oxide reduction under UV irradiation.

机构信息

Institut de Recherche Interdisciplinaire (USR-3078), Université de Lille1, Parc de la Haute Borne, 50 avenue de Halley, BP 70478, 59658, Villeneuve d'Ascq, France.

出版信息

Nanoscale. 2011 Nov;3(11):4662-9. doi: 10.1039/c1nr10970g. Epub 2011 Sep 29.

Abstract

This paper reports on efficient UV irradiation-induced reduction of exfoliated graphene oxide. Direct illumination of an aqueous solution of graphene oxide at λ = 312 nm for 6 h resulted in the formation of graphene nanosheets dispersible in water. X-Ray photoelectron spectroscopy (XPS), UV-vis spectroscopy, atomic force microscopy (AFM) and electrochemical measurements (cyclic voltammetry and electrochemical impedance spectroscopy) suggest a restoration of the sp(2) carbon network. The results were compared with graphene nanosheets prepared by photochemical irradiation of a GO aqueous solution in the presence of hydrogenated silicon nanowire (SiNW) arrays or silicon nanowire arrays decorated with silver (SiNW/Ag NPs) or copper nanoparticles (SiNW/Cu NPs). Graphene nanosheets obtained by illumination of the GO aqueous solution at 312 nm for 6 h in the presence of SiNW/Cu NPs exhibited superior electrochemical charge transfer characteristics. This is mainly due to the higher amount of sp(2)-hybridized carbon in these graphene sheets found by XPS analysis. The high level of extended conjugated carbon network was also evident by the water insoluble nature of the resulting graphene nanosheets, which precipitated upon photochemical reduction.

摘要

本文报道了高效的紫外辐照诱导剥离氧化石墨烯的还原。将氧化石墨烯的水溶液直接在 λ = 312nm 下照射 6 小时,导致形成在水中可分散的石墨烯纳米片。X 射线光电子能谱(XPS)、紫外-可见光谱、原子力显微镜(AFM)和电化学测量(循环伏安法和电化学阻抗谱)表明 sp(2) 碳网络得到了恢复。结果与通过在氢化硅纳米线(SiNW)阵列或用银(SiNW/Ag NPs)或铜纳米颗粒(SiNW/Cu NPs)修饰的硅纳米线阵列存在下光化学辐照氧化石墨烯水溶液制备的石墨烯纳米片进行了比较。在存在 SiNW/Cu NPs 的情况下,将氧化石墨烯水溶液在 312nm 下照射 6 小时得到的石墨烯纳米片具有优异的电化学电荷转移特性。这主要归因于通过 XPS 分析发现这些石墨烯片中 sp(2) 杂化碳的含量更高。高比例的扩展共轭碳网络也通过所得石墨烯纳米片的不溶于水的性质得到证明,这些石墨烯纳米片在光化学还原后沉淀。

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