Departamento de Química, Facultad de Ciencias, Universidad de Chile, Las Palmeras 3425, Casilla 653, Santiago, Chile.
Langmuir. 2011 Nov 15;27(22):13524-32. doi: 10.1021/la2025632. Epub 2011 Oct 18.
The adsorption of hydrophobically modified polyelectrolytes derived from poly(maleic anhydride-alt-styrene) (P(MA-alt-St)) containing in their side chain aryl-alkyl groups onto amino- or methyl-terminated silicon wafers was investigated. The effect of the spacer group, the chemical nature of the side chain, molecular weight of polyelectrolyte, and ionic strength of solution on the polyelectrolyte adsorbed amount was studied by null ellipsometry. The adsorbed amount of polyelectrolyte increased with increasing ionic strength, in agreement with the screening-enhanced adsorption regime, indicating that hydrophobic interactions with the surface play an important role in the adsorption process. At constant ionic strength, the adsorbed amount was slightly higher for polyelectrolytes with larger alkyl side chain and decreased with the hydrophobicity of aryl group. The adsorption behavior is discussed in terms of the side chain flexibility of the polymer. Characteristics of the adsorbed layer were studied by atomic force microscopy (AFM) and contact angle measurements. AFM images show the presence of aggregates and closed globular structure of polyelectrolyte onto the amino- or methyl-terminated surface, which agrees with a 3D and 2D growth mechanism, respectively. Fluorescence measurements showed that the aggregation of polyelectrolyte containing the hydrophobic naphthyl group occurs already in the solution. However, the aggregation of polyelectrolytes containing the phenyl group in its side chain is not observed in solution but is induced by the amino-terminated surface. This difference can be explained in terms of the higher flexibility of side chain bearing the phenyl group. The polyelectrolyte films showed a high chemical heterogeneity and moderate hydrophobicity.
本文研究了侧链中含有芳基-烷基的疏水改性聚电解质(聚(马来酸酐-alt-苯乙烯)(P(MA-alt-St)))在氨基或甲基封端的硅片上的吸附。通过无反射椭圆测量研究了间隔基、侧链化学性质、聚电解质分子量和溶液离子强度对聚电解质吸附量的影响。聚电解质的吸附量随离子强度的增加而增加,与屏蔽增强吸附区一致,表明疏水相互作用对吸附过程起重要作用。在恒定离子强度下,烷基侧链较大的聚电解质的吸附量略高,芳基的疏水性降低。根据聚合物侧链的灵活性讨论了吸附行为。通过原子力显微镜(AFM)和接触角测量研究了吸附层的特性。AFM 图像显示,聚电解质在氨基或甲基封端表面上存在聚集体和闭球形结构,分别符合 3D 和 2D 生长机制。荧光测量表明,含有疏水萘基的聚电解质在溶液中已经发生聚集。然而,在溶液中未观察到含有苯基侧链的聚电解质的聚集,但在氨基封端表面上被诱导。这种差异可以用带有苯基侧链的链的较高灵活性来解释。聚电解质膜表现出高化学异质性和适度的疏水性。