Research Center for Applied Sciences, Academia Sinica, Taipei 11529, Taiwan.
Phys Chem Chem Phys. 2012 Mar 7;14(9):3083-8. doi: 10.1039/c2cp23187e. Epub 2012 Jan 30.
We report that copper thin films deposited on top of graphene oxide (GO) serve as an effective catalyst to reduce GO sheets in a diluted hydrogen environment at high temperature. The reduced GO (rGO) sheets exhibit higher effective field-effect hole mobility, up to 80 cm(2) V(-1) s(-1), and lower sheet resistance (13 kΩ □(-1)) compared with those reduced by reported methods such as hydrazine and thermal annealing. Raman and XPS characterizations are addressed to study the reduction mechanism on graphene oxide underneath copper thin films. The level of reduction in rGO sheets is examined by Raman spectroscopy and it is well correlated with hole mobility values. The conductivity enhancement is attributed to the growth of the graphitic domain size. This method is not only suitable for reduction of single GO sheets but also applicable to lower the sheet resistance of Langmuir-Blodgett assembled GO films.
我们报告称,沉积在氧化石墨烯 (GO) 顶部的铜薄膜在高温下的稀释氢气环境中可作为还原 GO 片的有效催化剂。与报道的例如水合肼和热退火等方法还原的 GO 相比,还原的 GO (rGO) 片具有更高的有效场效应空穴迁移率,高达 80 cm(2) V(-1) s(-1),更低的薄层电阻 (13 kΩ □(-1))。拉曼和 XPS 表征用于研究铜薄膜下石墨烯氧化物的还原机制。通过拉曼光谱研究 rGO 片的还原程度,并与空穴迁移率值很好地相关。电导率的提高归因于石墨化域尺寸的生长。该方法不仅适用于单 GO 片的还原,也适用于降低 Langmuir-Blodgett 组装的 GO 膜的薄层电阻。