Interdisciplinary Nanoscience Center (iNANO) and Department of Physics and Astronomy, Aarhus University, Aarhus C, Denmark.
Nanotechnology. 2012 Sep 28;23(38):385708. doi: 10.1088/0957-4484/23/38/385708. Epub 2012 Sep 5.
The characterization of roughness at the nanoscale by the means of atomic force microscopy (AFM) was performed on high aspect ratio glancing angle deposited titanium thin films. With the use of scanning electron microscopy as well as x-ray photoelectron spectroscopy, it was shown that the AFM measurements gave rise to incorrect roughness values for the films consisting of the highest aspect ratio structures. By correcting for this experimental artefact, the difference between the saturated roughness value of a film grown with conventional physical vapour deposition and films grown with a glancing angle of deposition was shown to behave as a power law function of the deposition angle, with a saturated roughness exponent of κ = 7.1 ± 0.2. This power law scaling was confirmed by three-dimensional molecular dynamics simulations of glancing angle deposition, where the saturated roughness exponent was calculated to κ = 6.7 ± 0.4.
采用原子力显微镜（AFM）对高纵横比斜角沉积钛薄膜进行了纳米级粗糙度的特性描述。通过使用扫描电子显微镜和 X 射线光电子能谱，表明 AFM 测量会导致具有最高纵横比结构的薄膜产生不正确的粗糙度值。通过对这种实验假象进行修正，表明由常规物理气相沉积生长的薄膜和采用斜角沉积生长的薄膜之间的饱和粗糙度值之差表现为沉积角的幂律函数关系，饱和粗糙度指数κ为 7.1±0.2。这种幂律标度通过斜角沉积的三维分子动力学模拟得到了证实，其中计算得到的饱和粗糙度指数κ为 6.7±0.4。
