Département de Physique, Université de Montréal, 2900 Boulevard Edouard Montpetit, H3C 3J7 Montréal, Québec, Canada.
Phys Rev Lett. 2012 Jun 22;108(25):255501. doi: 10.1103/PhysRevLett.108.255501. Epub 2012 Jun 20.
High energy x-ray diffraction measurements of pure amorphous Ge were made and its radial distribution function (RDF) was determined at high resolution, revealing new information on the atomic structure of amorphous semiconductors. Fine structure in the second peak in the RDF provides evidence that a fraction of third neighbors are closer than some second neighbors; taking this into account leads to a narrow distribution of tetrahedral bond angles, (8.5 ± 0.1)°. A small peak which appears near 5 Å upon thermal annealing shows that some ordering in the dihedral bond-angle distribution takes place during structural relaxation. Extended range order is detected (in both a-Ge and a-Si) which persists to beyond 20 Å, and both the periodicity and its decay length increase upon thermal annealing. Previously, the effect of structural relaxation was only detected at intermediate range, involving reduced tetrahedral bond-angle distortions. These results enhance our understanding of the atomic order in continuous random networks and place significantly more stringent requirements on computer models intending to describe these networks, or their alternatives which attempt to describe the structure in terms of an arrangement of paracrystals.
对纯非晶态锗进行了高能 X 射线衍射测量,并以高分辨率确定了其径向分布函数 (RDF),揭示了非晶半导体原子结构的新信息。RDF 中第二个峰的精细结构提供了证据,表明一部分第三近邻比某些第二近邻更近;考虑到这一点,导致四面体键角分布变窄,(8.5 ± 0.1)°。热退火后在 5 Å 附近出现的一个小峰表明,在结构弛豫过程中,二面角分布发生了一些有序化。在非晶锗和非晶硅中都检测到了长程有序(在 a-Ge 和 a-Si 中),其延伸到 20 Å 以外,并且热退火后周期性和衰减长度都增加了。以前,结构弛豫的影响仅在中程范围内被检测到,涉及到四面体键角扭曲的减少。这些结果增强了我们对连续无规网络中原子有序性的理解,并对试图描述这些网络的计算机模型提出了更严格的要求,或者对试图根据准晶体排列来描述结构的替代模型提出了更严格的要求。