Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, Villigen, Switzerland.
Phys Rev Lett. 2012 Aug 3;109(5):057402. doi: 10.1103/PhysRevLett.109.057402. Epub 2012 Aug 1.
Direct-gap gain up to 850 cm(-1) at 0.74 eV is measured and modeled in optically pumped Ge-on-Si layers for photoexcited carrier densities of 2.0 × 10(20) cm(-3). The gain spectra are correlated to carrier density via plasma-frequency determinations from reflection spectra. Despite significant gain, optical amplification cannot take place, because the carriers also generate pump-induced absorption of ≈7000 cm(-1). Parallel studies of III-V direct-gap InGaAs layers validate our spectroscopy and modeling. Our self-consistent results contradict current explanations of lasing in Ge-on-Si cavities.
在光泵浦的 Ge-on-Si 层中测量并模拟了 0.74eV 时高达 850cm(-1)的直接带隙增益,光激发载流子密度为 2.0×10(20)cm(-3)。通过反射谱中的等离子体频率确定,将增益谱与载流子密度相关联。尽管存在显著的增益,但由于载流子也会产生约 7000cm(-1)的泵激吸收,因此无法进行光放大。对 III-V 直接带隙 InGaAs 层的平行研究验证了我们的光谱学和建模。我们的自洽结果与当前对 Ge-on-Si 腔激射的解释相矛盾。