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气相硝酸和水与自组装单分子层相互作用的实验和理论研究。

Experimental and theoretical studies of the interaction of gas phase nitric acid and water with a self-assembled monolayer.

机构信息

Department of Chemistry, University of California, Irvine, CA 92697-2025, USA.

出版信息

Phys Chem Chem Phys. 2013 Jan 14;15(2):448-58. doi: 10.1039/c2cp42405c. Epub 2012 Nov 16.

Abstract

Nitric acid in air is formed by atmospheric reactions of oxides of nitrogen and is removed primarily through deposition to surfaces, either as the gas or after conversion to particulate nitrate. Many of the surfaces and particles have organic coatings, but relatively little is known about the interaction of nitric acid with organic films. We report here studies of the interaction of gaseous HNO(3) with a self-assembled monolayer (SAM) formed by reacting 7-octenyltrichlorosilane [H(2)C=CH(CH(2))(6)SiCl(3)] with the surface of a germanium infrared-transmitting attenuated total reflectance (ATR) crystal that was coated with a thin layer of silicon oxide (SiO(x)). The SAM was exposed at 298 ± 2 K to dry HNO(3) in a flow of N(2), followed by HNO(3) in humid N(2) at a controlled relative humidity (RH) between 20-90%. For comparison, similar studies were carried out using a similar crystal without the SAM coating. Changes in the surface were followed using Fourier transform infared spectroscopy (FTIR). In the case of the SAM-coated crystal, molecular HNO(3) and smaller amounts of NO(3)(-) ions were observed on the surface upon exposure to dry HNO(3). Addition of water vapor led to less molecular HNO(3) and more H(3)O(+) and NO(3)(-) complexed to water, but surprisingly, molecular HNO(3) was still evident in the spectra up to 70% RH. This suggests that part of the HNO(3) observed was initially trapped in pockets within the SAM and shielded from water vapor. After increasing the RH to 90% and then exposing the film to a flow of dry N(2), molecular nitric acid was regenerated, as expected from recombination of protons and nitrate ions as water evaporated. The nitric acid ultimately evaporated from the film. On the other hand, exposure of the SAM to HNO(3) and H(2)O simultaneously gave only hydronium and nitrate ions. Molecular dynamics simulations of defective SAMs in the presence of HNO(3) and water predict that nitric acid intercalates in defects as a complex with a single water molecule that is protected by alkyl chains from interacting with additional water molecules. These studies are consistent with the recently proposed hydrophobic nature of HNO(3). Under atmospheric conditions, if HNO(3) is formed in organic layers on surfaces in the boundary layer, e.g. through NO(3) or N(2)O(5) reactions, it may exist to a significant extent in its molecular form rather than fully dissociated to nitrate ions.

摘要

空气中的硝酸是由氮氧化物的大气反应形成的,主要通过沉积到表面而被去除,无论是气体形式还是转化为颗粒态硝酸盐后。许多表面和颗粒都有有机涂层,但对硝酸与有机膜的相互作用知之甚少。我们在这里报告了气态 HNO(3)与通过 7-辛烯基三氯硅烷[H(2)C=CH(CH(2))(6)SiCl(3)]与涂有薄层氧化硅(SiO(x))的锗红外透射衰减全反射(ATR)晶体表面反应形成的自组装单层(SAM)相互作用的研究。SAM 在 298 ± 2 K 下在氮气流中暴露于干燥的 HNO(3)中,然后在控制相对湿度(RH)为 20-90%的湿氮气中暴露于 HNO(3)。为了进行比较,使用没有 SAM 涂层的类似晶体进行了类似的研究。使用傅立叶变换红外光谱(FTIR)跟踪表面的变化。对于涂有 SAM 的晶体,在暴露于干燥的 HNO(3)时,表面上观察到分子 HNO(3)和少量的 NO(3)(-)离子。添加水蒸气会导致分子 HNO(3)减少,而 H(3)O(+)和与水配位的 NO(3)(-)增加,但令人惊讶的是,在高达 70% RH 的光谱中仍能观察到分子 HNO(3)。这表明观察到的部分 HNO(3)最初被困在 SAM 中的口袋中,并免受水蒸气的影响。当 RH 增加到 90%,然后使薄膜暴露于干燥的氮气流中时,正如随着水蒸气蒸发质子和硝酸盐离子重新组合所预期的那样,分子硝酸再次生成。最终,硝酸从薄膜中蒸发。另一方面,SAM 同时暴露于 HNO(3)和 H(2)O 中仅得到氢离子和硝酸盐离子。在存在 HNO(3)和水的情况下,对缺陷 SAM 的分子动力学模拟预测,硝酸作为与单个水分子形成的复合物插入缺陷中,该水分子被烷基链保护免受与其他水分子的相互作用。这些研究与最近提出的 HNO(3)的疏水性一致。在大气条件下,如果 HNO(3)在边界层中表面的有机层中形成,例如通过 NO(3)或 N(2)O(5)反应,它可能以其分子形式大量存在,而不是完全离解为硝酸盐离子。

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