Suppr超能文献

通过控制表面形貌来提高 Ti-29Nb-13Ta-4.6Zr 羟基磷灰石薄膜的黏附强度。

Enhancement of adhesive strength of hydroxyapatite films on Ti-29Nb-13Ta-4.6Zr by surface morphology control.

机构信息

Department of Biomaterials Science, Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan.

出版信息

J Mech Behav Biomed Mater. 2013 Feb;18:232-9. doi: 10.1016/j.jmbbm.2012.11.013. Epub 2012 Dec 6.

Abstract

Hydroxyapatite (HAp) films were deposited on a β-type titanium alloy, Ti-29Nb-13Ta-4.6Zr (TNTZ), by metal organic chemical vapor deposition (MOCVD) in order to improve its hard-tissue compatibility. The surface morphologies of TNTZ substrates were changed by acid treatments and mechanical polishing prior to the HAp film deposition. The adhesive strength of the HAp films formed on TNTZ substrates treated with an HF solution increased to twice that of the HAp film deposited on a TNTZ substrate with a mirror-like finish. Complex microstructures with deeply etched grain boundaries, formed on the TNTZ substrates after immersion in the HF solution, were responsible for the increase in the adhesive strength of the HAp film caused by an interlocking effect. The HAp films on TNTZ substrates treated with a H(2)SO(4) solution exhibited lower adhesive strength than HAp films on TNTZ substrates treated with HF solution, regardless of the surface roughness of the substrates. Additionally, acid treatments using HNO(3) and H(2)O(2) solutions did not change the surface morphologies of the TNTZ substrates. The complex microstructures with deeply etched grain boundaries and nanosized asperities formed on the TNTZ substrates are important factors in the improvement of the adhesive strengths of HAp films deposited on TNTZ substrates.

摘要

采用金属有机化学气相沉积(MOCVD)法在β 型钛合金 Ti-29Nb-13Ta-4.6Zr(TNTZ)上沉积羟基磷灰石(HAp)薄膜,以提高其与硬组织的相容性。在沉积 HAp 薄膜之前,通过酸处理和机械抛光来改变 TNTZ 基底的表面形貌。用 HF 溶液处理后的 TNTZ 基底上形成的 HAp 薄膜的结合强度增加到具有镜面光洁度的 TNTZ 基底上形成的 HAp 薄膜的两倍。在 HF 溶液中浸泡后,在 TNTZ 基底上形成的具有深晶界刻蚀的复杂微观结构,通过联锁效应导致 HAp 薄膜的结合强度增加。用 H(2)SO(4)溶液处理的 TNTZ 基底上的 HAp 薄膜的结合强度低于用 HF 溶液处理的 TNTZ 基底上的 HAp 薄膜,而与基底的表面粗糙度无关。此外,用 HNO(3)和 H(2)O(2)溶液进行的酸处理没有改变 TNTZ 基底的表面形貌。在 TNTZ 基底上形成的具有深晶界刻蚀和纳米级凸起的复杂微观结构是提高沉积在 TNTZ 基底上的 HAp 薄膜结合强度的重要因素。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验