Hubei Collaborative Innovation Center for Advanced Organic Chemical Materials, Faculty of Physics and Electronic Technology, Hubei University, Wuhan 430062, PR China.
ACS Appl Mater Interfaces. 2013 Apr 24;5(8):3312-6. doi: 10.1021/am4003793. Epub 2013 Apr 4.
The effect of a ZnS thin layer on the photoelectrochemical property of ZnO/CdTe nanocable arrays-on-indium tin oxide was systematically studied by the successive ion layer absorption and reaction (SILAR) of ZnS. The thickness of CdTe on bare ZnO/CdTe nanocable arrays was optimized to approximately 10 nm to achieve a saturated photocurrent density of 6.5 mA/cm(2). Significant photocurrent enhancement was achieved by gradually increasing the ZnS SILAR cycle number from 0 to 10. A "type I" band alignment with conduction and valence band offsets of 0.58 and 1.52 eV, respectively, was deduced for the CdTe/ZnS interface. The detailed microstructure of the CdTe/ZnS interface and the relationship between the photocurrent and the ZnS thickness indicated that ZnS not only serves as a barrier layer that prevents electron injection from CdTe to the electrolyte but also provides an effective tunneling channel for hole transfers to the electrolyte. A ZnO/CdTe/ZnS nanocable photoanode yielded a saturated photocurrent density of 13.8 mA/cm(2) when the thickness of ZnS was controlled to approximately 2 nm.
采用连续离子层吸附反应(SILAR)法在 ZnO/CdTe 纳米电缆阵列-氧化铟锡上沉积 ZnS 薄层,系统研究了其对 ZnO/CdTe 纳米电缆阵列光电化学性能的影响。将裸 ZnO/CdTe 纳米电缆阵列上的 CdTe 厚度优化至约 10nm,以获得饱和光电流密度为 6.5mA/cm(2)。通过逐渐增加 ZnS SILAR 循环次数从 0 增加到 10,实现了显著的光电流增强。CdTe/ZnS 界面的能带排列为“Ⅰ型”,导带和价带偏移分别为 0.58 和 1.52eV。CdTe/ZnS 界面的详细微观结构以及光电流与 ZnS 厚度之间的关系表明,ZnS 不仅作为阻挡层防止电子从 CdTe 注入到电解质中,而且还为空穴向电解质的有效隧穿提供了通道。当 ZnS 厚度控制在约 2nm 时,ZnO/CdTe/ZnS 纳米电缆光阳极的饱和光电流密度为 13.8mA/cm(2)。