Boğaziçi University, Institute of Environmental Sciences, 34342 Bebek, Istanbul, Turkey.
J Hazard Mater. 2013 Dec 15;263 Pt 2:275-82. doi: 10.1016/j.jhazmat.2013.03.052. Epub 2013 Mar 28.
The evolution of degradation products and changes in acute toxicity during advanced oxidation of the nonionic surfactant nonylphenol decaethoxylate (NP-10) with the H2O2/UV-C and photo-Fenton processes were investigated. H2O2/UV-C and photo-Fenton processes ensured complete removal of NP-10, which was accompanied by the generation of polyethylene glycols with 3-8 ethoxy units. Formation of aldehydes and low carbon carboxylic acids was evidenced. According to the acute toxicity tests carried out with Vibrio fischeri, degradation products being more inhibitory than the original NP-10 solution were formed after the H2O2/UV-C process, whereas the photo-Fenton process appeared to be toxicologically safer since acute toxicity did not increase relative to the original NP-10 solution after treatment. Temporal evolution of the acute toxicity was strongly correlated with the identified carboxylic acids being formed during the application of H2O2/UV-C and photo-Fenton processes.
研究了 H2O2/UV-C 和光芬顿工艺对非离子表面活性剂壬基酚聚氧乙烯醚（NP-10）进行高级氧化时降解产物的演变和急性毒性的变化。H2O2/UV-C 和光芬顿工艺确保了 NP-10 的完全去除，同时生成了 3-8 个乙氧基单元的聚乙二醇。醛和低碳羧酸的形成得到了证实。根据采用发光菌进行的急性毒性试验，与原始 NP-10 溶液相比，H2O2/UV-C 工艺后形成了抑制性更强的降解产物，而光芬顿工艺的毒性似乎更安全，因为处理后相对于原始 NP-10 溶液，急性毒性没有增加。急性毒性的时间演变与在应用 H2O2/UV-C 和光芬顿工艺过程中形成的鉴定羧酸密切相关。
