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一种新型的紧密连接蛋白重排可导致脑钙化和肾功能障碍。

A novel rearrangement of occludin causes brain calcification and renal dysfunction.

机构信息

Department of Pathology, Dalhousie University, 5850 College St., Sir Charles Tupper Medical Building, Room 11-F, Halifax, NS, Canada.

出版信息

Hum Genet. 2013 Nov;132(11):1223-34. doi: 10.1007/s00439-013-1327-y. Epub 2013 Jun 21.

Abstract

Pediatric intracranial calcification may be caused by inherited or acquired factors. We describe the identification of a novel rearrangement in which a downstream pseudogene translocates into exon 9 of OCLN, resulting in band-like brain calcification and advanced chronic kidney disease in early childhood. SNP genotyping and read-depth variation from whole exome sequencing initially pointed to a mutation in the OCLN gene. The high degree of identity between OCLN and two pseudogenes required a combination of multiplex ligation-dependent probe amplification, PCR, and Sanger sequencing to identify the genomic rearrangement that was the underlying genetic cause of the disease. Mutations in exon 3, or at the 5-6 intron splice site, of OCLN have been reported to cause brain calcification and polymicrogyria with no evidence of extra-cranial phenotypes. Of the OCLN splice variants described, all make use of exon 9, while OCLN variants that use exons 3, 5, and 6 are tissue specific. The genetic rearrangement we identified in exon 9 provides a plausible explanation for the expanded clinical phenotype observed in our individuals. Furthermore, the lack of polymicrogyria associated with the rearrangement of OCLN in our patients extends the range of cranial defects that can be observed due to OCLN mutations.

摘要

儿科颅内钙化可能由遗传或获得性因素引起。我们描述了一种新的重排,其中一个下游假基因易位到 OCLN 的外显子 9,导致儿童早期出现带状脑钙化和晚期慢性肾脏病。SNP 基因分型和全外显子组测序的读深变异最初指向 OCLN 基因的突变。OCLN 与两个假基因之间的高度同源性需要结合多重连接依赖性探针扩增、PCR 和 Sanger 测序来鉴定导致疾病的基因组重排。已报道 OCLN 外显子 3 或 5-6 内含子剪接位点的突变可导致脑钙化和多小脑回,但无颅外表型的证据。描述的 OCLN 剪接变体均利用外显子 9,而利用外显子 3、5 和 6 的 OCLN 变体则具有组织特异性。我们在外显子 9 中鉴定的遗传重排为我们观察到的扩展临床表型提供了一个合理的解释。此外,我们患者的 OCLN 重排与多小脑回无关,这扩大了由于 OCLN 突变而可能观察到的颅面缺陷范围。

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