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二氯代二硅氧烷与氧化钨表面的共价键合。

Covalent attachment of diamondoid phosphonic acid dichlorides to tungsten oxide surfaces.

机构信息

Geballe Laboratory for Advanced Materials, Stanford University, 476 Lomita Mall, Stanford, California 94305, United States.

出版信息

Langmuir. 2013 Aug 6;29(31):9790-7. doi: 10.1021/la401781e. Epub 2013 Jul 25.

Abstract

Diamondoids (nanometer-sized diamond-like hydrocarbons) are a novel class of carbon nanomaterials that exhibit negative electron affinity (NEA) and strong electron-phonon scattering. Surface-bound diamondoid monolayers exhibit monochromatic photoemission, a unique property that makes them ideal electron sources for electron-beam lithography and high-resolution electron microscopy. However, these applications are limited by the stability of the chemical bonding of diamondoids on surfaces. Here we demonstrate the stable covalent attachment of diamantane phosphonic dichloride on tungsten/tungsten oxide surfaces. X-ray photoelectron spectroscopy (XPS) and Fourier-transform infrared (FTIR) spectroscopy revealed that diamondoid-functionalized tungsten oxide films were stable up to 300-350 °C, a substantial improvement over conventional diamondoid thiolate monolayers on gold, which dissociate at 100-200 °C. Extreme ultraviolet (EUV) light stimulated photoemission from these diamondoid phosphonate monolayers exhibited a characteristic monochromatic NEA peak with 0.2 eV full width at half-maximum (fwhm) at room temperature, showing that the unique monochromatization property of diamondoids remained intact after attachment. Our results demonstrate that phosphonic dichloride functionality is a promising approach for forming stable diamondoid monolayers for elevated temperature and high-current applications such as electron emission and coatings in micro/nano electromechanical systems (MEMS/NEMS).

摘要

类金刚石碳纳米材料(纳米级金刚石状碳氢化合物)是一类新型的碳纳米材料,具有负电子亲和势(NEA)和强电子-声子散射。表面结合的类金刚石烷单层表现出单色光发射,这一独特的性质使它们成为电子束光刻和高分辨率电子显微镜的理想电子源。然而,这些应用受到类金刚石烷在表面上化学结合稳定性的限制。在这里,我们展示了在钨/氧化钨表面上稳定的金刚烷膦酸二氯的共价附着。X 射线光电子能谱(XPS)和傅里叶变换红外(FTIR)光谱表明,类金刚石烷功能化的氧化钨薄膜在 300-350°C 下稳定,这比传统的金上的类金刚石烷硫醇单层有了实质性的提高,后者在 100-200°C 时就会解离。这些类金刚石烷膦酸盐单层在极端紫外(EUV)光激发下的光发射表现出特征性的单色 NEA 峰,室温下半峰全宽(fwhm)为 0.2 eV,表明在附着后,类金刚石烷的独特单色化性质保持不变。我们的结果表明,膦酸二氯官能团是形成稳定的类金刚石烷单层的一种很有前途的方法,可用于高温和大电流应用,如电子发射和微/纳机电系统(MEMS/NEMS)中的涂层。

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