Zhao Zhen-Yu, Song Zhi-Qiang, Shi Wang-Zhou, Zhao Quan-Zhong
Opt Express. 2014 May 19;22(10):11654-9. doi: 10.1364/OE.22.011654.
We observe an enhancement of optical absorption and photocurrent from semi-insulating gallium arsenide (SI-GaAs) irradiated by femtosecond laser pulses. The SI-GaAs wafer is treated by a regeneratively amplified Ti: Sapphire laser of 120 fs laser pulse at 800 nm wavelength. The laser ablation induced 0.74 μm periodic ripples, and its optical absorption-edge is shifted to a longer wavelength. Meanwhile, the steady photocurrent of irradiated SI-GaAs is found to enhance 50%. The electrical properties of samples are calibrated by van der Pauw method. It is found that femtosecond laser ablation causes a microscale anti-reflection coating surface which enhances the absorption and photoconductivity.
我们观察到,飞秒激光脉冲辐照半绝缘砷化镓(SI-GaAs)后,其光吸收和光电流增强。用波长800nm、激光脉冲为120fs的再生放大钛宝石激光器对SI-GaAs晶片进行处理。激光烧蚀产生了0.74μm的周期性波纹,其光吸收边移向更长波长。同时,发现辐照后的SI-GaAs的稳态光电流增强了50%。用范德堡法校准样品的电学性质。发现飞秒激光烧蚀形成了一个微尺度抗反射涂层表面,增强了吸收和光电导性。