Liu Yonghuan, Wang Rutao, Lang Junwei, Yan Xingbin
Laboratory of Clean Energy Chemistry and Materials, State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, P. R. China.
Phys Chem Chem Phys. 2015 Jun 7;17(21):14028-35. doi: 10.1039/c5cp00646e. Epub 2015 May 8.
To study the formation mechanism and influencing factors of graphene quantum dots (GQDs), GQDs with different average sizes were prepared using a modified hydrothermal method with hydrogen peroxide (H2O2) as an etching agent and ammonia as an assistant. It is found that size-controlled GQDs were prepared by adjusting the amount of ammonia and porous reduced graphene oxide (PRGO) debris can be synthesized by reducing the hydrothermal reaction time. Structural changes of final products were mainly attributed to the changes in the etching ability of the hydroxyl radical (OH˙) against the reduction ability of the hydroxyl group (OH(-)) in different alkaline environments regulated by ammonia. Furthermore, we studied the electrochemical properties of GQDs and PRGO. The results showed that the specific capacitance of all samples increases linearly with the size and the smallest GQDs can work at the highest scan rate of as high as 5000 V s(-1) with an ultra-fast power response (τ0 = 63.3 μs). Thus, these findings elucidate the formation mechanism of GQDs and demonstrate that GQDs are applicable in microelectronic devices with high power response requirements.
为了研究石墨烯量子点(GQDs)的形成机制及影响因素,采用改进的水热法,以过氧化氢(H2O2)作为蚀刻剂、氨作为助剂,制备了不同平均尺寸的GQDs。研究发现,通过调节氨的用量可制备尺寸可控的GQDs,缩短水热反应时间可合成多孔还原氧化石墨烯(PRGO)碎片。最终产物的结构变化主要归因于在氨调节的不同碱性环境中,羟基自由基(OH˙)的蚀刻能力与羟基(OH(-))的还原能力的变化。此外,研究了GQDs和PRGO的电化学性质。结果表明,所有样品的比电容均随尺寸呈线性增加,最小尺寸的GQDs能够在高达5000 V s(-1)的最高扫描速率下工作,具有超快的功率响应(τ0 = 63.3 μs)。因此,这些发现阐明了GQDs的形成机制,并证明GQDs适用于对功率响应有高要求的微电子器件。