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通过密度泛函理论研究 BiVO4 不同晶面间光生电荷分离的本质。

The nature of photogenerated charge separation among different crystal facets of BiVO4 studied by density functional theory.

机构信息

State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian National Laboratory for Clean Energy, 457 Zhongshan Road, Dalian 116023, P. R. China.

出版信息

Phys Chem Chem Phys. 2015 Sep 28;17(36):23503-10. doi: 10.1039/c5cp04299b. Epub 2015 Aug 21.

Abstract

Charge separation among different crystal facets of a semiconductor has been observed experimentally, but the underlying reasons behind this phenomenon are unknown. In this work, the activation energies of carrier hopping and the mobility of electron/hole transport along seven low-index crystal orientations of bulk BiVO4 have been calculated using a small polaron model. The calculated mobility and our previous experimental results reveal that there is a parallel relationship between the carrier mobility along the crystal axis and the carrier preferred accumulation on the corresponding crystal facets. It is proposed that the mobility of electrons (or holes) along the crystal axis [hkl] might be essentially related to the charge separation among the indices of corresponding facets (hkl); namely, the mobility of electrons (or holes) along the crystal axis [hkl] is the largest among all possible crystal axes, and the photogenerated electrons (or holes) tend to be accumulated on the indices of the corresponding facet (hkl) when the surface factors like surface band bending, surface energetic differences, etc. are not considered.

摘要

不同晶面的半导体之间的电荷分离已经在实验中被观察到,但这种现象背后的根本原因尚不清楚。在这项工作中,使用小极化子模型计算了体相 BiVO4 的七个低指数晶面的载流子跃迁的激活能和电子/空穴沿晶面传输的迁移率。计算的迁移率和我们之前的实验结果表明,载流子在晶轴上的迁移率与相应晶面上载流子的优先积累之间存在平行关系。提出电子(或空穴)沿晶轴[hkl]的迁移率可能与相应晶面指数之间的电荷分离本质上有关;即,电子(或空穴)沿晶轴[hkl]的迁移率在所有可能的晶轴中最大,并且当不考虑表面能带弯曲、表面能量差异等表面因素时,光生电子(或空穴)倾向于在相应的晶面指数上积累。

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