在原子探针数据中映射界面过剩。

Mapping interfacial excess in atom probe data.

作者信息

Felfer Peter, Scherrer Barbara, Demeulemeester Jelle, Vandervorst Wilfried, Cairney Julie M

机构信息

School of Aerospace Mechanical and Mechatronic Engineering, The University of Sydney, Australia; Australian Centre for Microscopy and Microanalysis, The University of Sydney, Australia.

Australian Centre for Microscopy and Microanalysis, The University of Sydney, Australia; Eidgenossische Technische Hochschule Zürich, Switzerland.

出版信息

Ultramicroscopy. 2015 Dec;159 Pt 2:438-44. doi: 10.1016/j.ultramic.2015.06.002. Epub 2015 Aug 22.

DOI:10.1016/j.ultramic.2015.06.002

PMID:26346774

Abstract

Using modern wide-angle atom probes, it is possible to acquire atomic scale 3D data containing 1000 s of nm(2) of interfaces. It is therefore possible to probe the distribution of segregated species across these interfaces. Here, we present techniques that allow the production of models for interfacial excess (IE) mapping and discuss the underlying considerations and sampling statistics. We also show, how the same principles can be used to achieve thickness mapping of thin films. We demonstrate the effectiveness on example applications, including the analysis of segregation to a phase boundary in stainless steel, segregation to a metal-ceramic interface and the assessment of thickness variations of the gate oxide in a fin-FET.

摘要

使用现代广角原子探针，可以获取包含数千平方纳米界面的原子尺度三维数据。因此，有可能探测这些界面上偏析物种的分布。在此，我们展示了能够生成界面过剩（IE）映射模型的技术，并讨论了潜在的考虑因素和采样统计。我们还展示了如何运用相同原理实现薄膜厚度映射。我们通过示例应用证明了其有效性，包括对不锈钢中相界偏析、金属 - 陶瓷界面偏析的分析以及鳍式场效应晶体管中栅极氧化物厚度变化的评估。