Zou Jijun, Zhang Yijun, Deng Wenjuan, Peng Xincun, Jiang Shaotao, Chang Benkang
Appl Opt. 2015 Oct 1;54(28):8521-5. doi: 10.1364/AO.54.008521.
The effects of AlGaAs/GaAs layer thickness and Al composition range on the spectral response and integral sensitivities of reflection-mode graded band-gap AlGaAs/GaAs photocathodes have been investigated and simulated. The experimental results demonstrate that the spectral response over the wavelength region of interest for graded band-gap photocathodes is greater than that for uniform band-gap cathodes, and the increase in long-wavelength response is more pronounced. These results can be attributed to the built-in electric field in the graded band-gap AlGaAs layer. We established a spectral response model of graded band-gap photocathodes based on the numerical solution of coupled Poisson and continuity equations. According to the model, we calculated the theoretical spectral response and sensitivities of graded band-gap cathodes, and found the optimum Al(x)Ga(1-x)As layer thicknesses are 6, 10, 16, and 22 μm for the reflection-mode cathodes with linearly graded Al composition x ranges of 0 to 0.1, 0.2, 0.3, and 0.4, respectively.
研究并模拟了AlGaAs/GaAs层厚度和Al组分范围对反射模式渐变带隙AlGaAs/GaAs光电阴极光谱响应和积分灵敏度的影响。实验结果表明,渐变带隙光电阴极在感兴趣波长区域的光谱响应大于均匀带隙阴极,且长波长响应的增加更为显著。这些结果可归因于渐变带隙AlGaAs层中的内建电场。基于泊松方程和连续性方程的数值解,建立了渐变带隙光电阴极的光谱响应模型。根据该模型,计算了渐变带隙阴极的理论光谱响应和灵敏度,发现对于线性渐变Al组分x范围分别为0至0.1、0.2、0.3和0.4的反射模式阴极,最佳Al(x)Ga(1-x)As层厚度分别为6、10、16和22μm。