Dravecz Gabriella, Bencs László, Beke Dávid, Gali Adam
Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Hungarian Academy of Sciences, P.O. Box 49, H-1525 Budapest, Hungary.
Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Hungarian Academy of Sciences, P.O. Box 49, H-1525 Budapest, Hungary.
Talanta. 2016 Jan 15;147:271-5. doi: 10.1016/j.talanta.2015.09.067. Epub 2015 Sep 30.
The determination of Al contaminant and the main component Si in silicon carbide (SiC) nanocrystals with the size-distribution of 1-8nm dispersed in an aqueous solution was developed using high-resolution continuum source graphite furnace atomic absorption spectrometry (HR-CS-GFAAS). The vaporization/atomization processes were investigated in a transversally heated graphite atomizer by evaporating solution samples of Al and Si preserved in various media (HCl, HNO3). For Si, the best results were obtained by applying a mixture of 5µg Pd plus 5µg Mg, whereas for Al, 10µg Mg (each as nitrate solution) was dispensed with the samples, but the results obtained without modifier were found to be better. This way a maximum pyrolysis temperature of 1200°C for Si and 1300°C for Al could be used, and the optimum (compromise) atomization temperature was 2400°C for both analytes. The Si and Al contents of different sized SiC nanocrystals, dispersed in aqueous solutions, were determined against aqueous (external) calibration standards. The correlation coefficients (R values) of the calibrations were found to be 0.9963 for Si and 0.9991 for Al. The upper limit of the linear calibration range was 2mg/l Si and 0.25mg/l Al. The limit of detection was 3µg/l for Si and 0.5µg/l for Al. The characteristic mass (m0) was calculated to be 389pg Si and 6.4pg Al. The Si and Al content in the solution samples were found to be in the range of 1.0-1.7mg/l and 0.1-0.25mg/l, respectively.
采用高分辨率连续光源石墨炉原子吸收光谱法(HR-CS-GFAAS),对尺寸分布为1-8nm且分散于水溶液中的碳化硅(SiC)纳米晶体中的铝污染物及主要成分硅进行了测定。通过蒸发保存在各种介质(HCl、HNO3)中的铝和硅的溶液样品,在横向加热石墨原子化器中研究了蒸发/原子化过程。对于硅,加入5μg钯和5μg镁的混合物可获得最佳结果,而对于铝,向样品中加入10μg镁(均为硝酸盐溶液),但发现不加基体改进剂时获得的结果更好。采用这种方法,硅的最高灰化温度可达1200°C,铝的最高灰化温度可达1300°C,两种分析物的最佳(折衷)原子化温度均为2400°C。针对水相(外部)校准标准,测定了分散于水溶液中的不同尺寸SiC纳米晶体中的硅和铝含量。校准的相关系数(R值)硅为0.9963,铝为0.9991。线性校准范围的上限硅为2mg/l,铝为0.25mg/l。硅的检测限为3μg/l,铝的检测限为0.5μg/l。计算得出特征质量(m0)硅为389pg,铝为6.4pg。溶液样品中的硅和铝含量分别在1.0-1.7mg/l和0.1-0.25mg/l范围内。