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用于关节置换的氮化硅涂层的溶解行为

Dissolution behaviour of silicon nitride coatings for joint replacements.

作者信息

Pettersson Maria, Bryant Michael, Schmidt Susann, Engqvist Håkan, Hall Richard M, Neville Anne, Persson Cecilia

机构信息

Materials in Medicine Group, Div. of Applied Materials Science, Dept. of Engineering Sciences, Uppsala University, Uppsala, Sweden.

Institute of Functional Surfaces (iFS), School of Mechanical Engineering, University of Leeds, Leeds, United Kingdom.

出版信息

Mater Sci Eng C Mater Biol Appl. 2016 May;62:497-505. doi: 10.1016/j.msec.2016.01.049. Epub 2016 Jan 22.

Abstract

In this study, the dissolution rate of SiNx coatings was investigated as a function of coating composition, in comparison to a cobalt chromium molybdenum alloy (CoCrMo) reference. SiNx coatings with N/Si ratios of 0.3, 0.8 and 1.1 were investigated. Electrochemical measurements were complemented with solution (inductively coupled plasma techniques) and surface analysis (vertical scanning interferometry and x-ray photoelectron spectroscopy). The dissolution rate of the SiNx coatings was evaluated to 0.2-1.4 nm/day, with a trend of lower dissolution rate with higher N/Si atomic ratio in the coating. The dissolution rates of the coatings were similar to or lower than that of CoCrMo (0.7-1.2 nm/day). The highest nitrogen containing coating showed mainly Si-N bonds in the bulk as well as at the surface and in the dissolution area. The lower nitrogen containing coatings showed Si-N and/or Si-Si bonds in the bulk and an increased formation of Si-O bonds at the surface as well as in the dissolution area. The SiNx coatings reduced the metal ion release from the substrate. The possibility to tune the dissolution rate and the ability to prevent release of metal ions encourage further studies on SiNx coatings for joint replacements.

摘要

在本研究中,与钴铬钼合金(CoCrMo)参考材料相比,研究了SiNx涂层的溶解速率与涂层成分的关系。研究了N/Si比为0.3、0.8和1.1的SiNx涂层。通过溶液分析(电感耦合等离子体技术)和表面分析(垂直扫描干涉测量法和X射线光电子能谱)对电化学测量进行补充。SiNx涂层的溶解速率评估为0.2 - 1.4纳米/天,涂层中N/Si原子比越高,溶解速率越低。涂层的溶解速率与CoCrMo的溶解速率(0.7 - 1.2纳米/天)相似或更低。含氮量最高的涂层在整体、表面及溶解区域主要显示Si - N键。含氮量较低的涂层在整体中显示Si - N和/或Si - Si键,在表面及溶解区域Si - O键的形成增加。SiNx涂层减少了基体中金属离子的释放。调节溶解速率的可能性以及防止金属离子释放的能力促使对用于关节置换的SiNx涂层进行进一步研究。

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