Department of Energy and Materials Engineering, Dongguk University , 30, Pildong-ro 1-gil, Jung-gu, Seoul 100-715, Republic of Korea.
Center for Plastic Electronics, Department of Physics, Blackett Laboratory, Imperial College London , London SW7 2AZ, United Kingdom.
ACS Appl Mater Interfaces. 2016 Jul 13;8(27):17416-20. doi: 10.1021/acsami.6b03671. Epub 2016 Jun 29.
The threshold voltage and onset voltage for p-channel and n-channel regimes of solution-processed ambipolar organic transistors with top-gate/bottom-contact (TG/BC) geometry were effectively tuned by gate buffer layers in between the gate electrode and the dielectric. The work function of a pristine Al gate electrode (-4.1 eV) was modified by cesium carbonate and vanadium oxide to -2.1 and -5.1 eV, respectively, which could control the flat-band voltage, leading to a remarkable shift of transfer curves in both negative and positive gate voltage directions without any side effects. One important feature is that the mobility of transistors is not very sensitive to the gate buffer layer. This method is simple but useful for electronic devices where the threshold voltage should be precisely controlled, such as ambipolar circuits, memory devices, and light-emitting device applications.
采用顶栅底接触(TG/BC)几何结构的溶液处理双极性有机晶体管的 p 沟道和 n 沟道的阈值电压和开启电压可通过栅极和介电层之间的栅极缓冲层有效调节。原始的 Al 栅电极(-4.1 eV)的功函数分别通过碳酸铯和氧化钒修饰为-2.1 和-5.1 eV,这可以控制平带电压,导致在没有任何副作用的情况下,在负栅极电压和正栅极电压方向上的转移曲线发生显著偏移。一个重要特点是,晶体管的迁移率对栅极缓冲层的变化不敏感。这种方法简单但对于阈值电压需要精确控制的电子器件非常有用,例如双极性电路、存储器件和发光器件应用。