Wei Shuli, Li Da, Lv Yunzhou, Liu Zhao, Xu Chunhong, Tian Fubo, Duan Defang, Liu Bingbing, Cui Tian
State Key Laboratory of Superhard Materials, College of Physics, Jilin University, Changchun, 130012, People's Republic of China.
Phys Chem Chem Phys. 2016 Jul 21;18(27):18074-80. doi: 10.1039/c6cp01649a. Epub 2016 Jun 21.
Tantalum-boron compounds, which are potential candidates for superhard multifunctional materials, may possess multiple stoichiometries and structures under pressure. Using first-principle methods, ground-state TaB3 with the monoclinic C2/m space group and high-pressure TaB4 with the orthorhombic Amm2 space group have been found. They are more stable than the previously proposed structures. High-pressure boron-rich Amm2-TaB4 can be quenched to ambient pressure. The ground-state C2/m-TaB3 and high-pressure Amm2-TaB4 are two potential ultra-incompressible and hard materials with a calculated hardness of 17.02 GPa and 30.02 GPa at ambient pressure, respectively. Detailed electronic structure and chemical bonding analysis proved that the high hardness value of Amm2-TaB4 mainly stems from the strong covalent boron-boron bonds in graphene-like B layers as well as B-B bonds between layers.
钽硼化合物是超硬多功能材料的潜在候选物,在压力下可能具有多种化学计量比和结构。利用第一性原理方法,发现了具有单斜C2/m空间群的基态TaB3和具有正交Amm2空间群的高压TaB4。它们比先前提出的结构更稳定。高压富硼Amm2-TaB4可以淬火到常压。基态C2/m-TaB3和高压Amm2-TaB4是两种潜在的超不可压缩和硬质材料,在常压下计算出的硬度分别为17.02 GPa和30.02 GPa。详细的电子结构和化学键分析证明,Amm2-TaB4的高硬度值主要源于类石墨烯B层中强的共价硼-硼键以及层间的B-B键。