Department of Chemistry, Simon Fraser University , 8888 University Drive, Burnaby, British Columbia V5A 1S6, Canada.
Langmuir. 2016 Jul 26;32(29):7284-93. doi: 10.1021/acs.langmuir.6b00662. Epub 2016 Jul 18.
We demonstrate the method of a rapid covalent modification of silicon oxide surfaces with alcohol-containing compounds with assistance by microwave reactions. Alcohol-containing compounds are prevalent reagents in the laboratory, which are also relatively easy to handle because of their stability against exposure to atmospheric moisture. The condensation of these alcohols with the surfaces of silicon oxides is often hindered by slow reaction kinetics. Microwave radiation effectively accelerates this condensation reaction by heating the substrates and/or solvents. A variety of substrates were modified in this demonstration, such as silicon oxide films of various thicknesses, glass substrates such as microscope slides (soda lime), and quartz. The monolayers prepared through this strategy demonstrated the successful formation of covalent surface modifications of silicon oxides with water contact angles of up to 110° and typical hysteresis values of 2° or less. An evaluation of the hydrolytic stability of these monolayers demonstrated their excellent stability under acidic conditions. The techniques introduced in this article were successfully applied to tune the surface chemistry of silicon oxides to achieve hydrophobic, oleophobic, and/or charged surfaces.
我们展示了一种利用微波反应辅助的方法，快速将含醇化合物共价修饰到氧化硅表面上。含醇化合物是实验室中常用的试剂，由于其对大气湿度的稳定性，因此相对容易处理。这些醇与氧化硅表面的缩合反应常常由于反应动力学缓慢而受到阻碍。微波辐射通过加热基底和/或溶剂，有效地加速了这个缩合反应。在这个演示中，对多种基底进行了修饰，例如各种厚度的氧化硅薄膜、显微镜载玻片（钠钙玻璃）等玻璃基底和石英。通过这种策略制备的单层膜展示了成功的将氧化硅表面进行共价修饰，水接触角高达 110°，且典型滞后值小于 2°。对这些单层膜的水解稳定性进行评估，证明了它们在酸性条件下具有极好的稳定性。本文介绍的技术成功地应用于调节氧化硅的表面化学，以实现疏水性、疏油性和/或带电表面。
