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浑浊双折射介质中偏振光的多次散射:蒙特卡罗模拟

Multiple scattering of polarized light in turbid birefringent media: a Monte Carlo simulation.

作者信息

Otsuki Soichi

出版信息

Appl Opt. 2016 Jul 20;55(21):5652-64. doi: 10.1364/AO.55.005652.

Abstract

Multiple scattering of polarized light in a birefringent turbid plane medium was studied using a Monte Carlo simulation. The reduced effective scattering Mueller matrix obtained in the simulation was factorized in two dimensions using the Lu-Chipman decomposition, yielding polarization parameters that exhibited dependences on the azimuth and the radial distance around the illumination point. We propose a double-scattering model for the propagation of polarized photons in turbid infinite plane media. When the birefringence slow axis is along the azimuth of 90° on the plane surface, the retardance becomes the largest negative along the azimuth of 0° and the largest positive along the azimuth of 90° and increases with increasing the azimuth from 0° to 90°. This azimuthal dependence may result from the overlap of the contributions from the light propagations vertical to, and lateral along, the plane surface. Thus, the dependences on the azimuth and the radial distance of the polarization parameters, such as the retardance, its orientation, optical rotation, and the depolarization coefficients, are correctly predicted.

摘要

利用蒙特卡罗模拟研究了双折射混浊平面介质中偏振光的多次散射。模拟中获得的约化有效散射穆勒矩阵使用Lu-Chipman分解在二维上进行分解,得到的偏振参数表现出对照射点周围方位角和径向距离的依赖性。我们提出了一个用于偏振光子在混浊无限平面介质中传播的双散射模型。当双折射慢轴沿平面表面方位角90°方向时,延迟在方位角0°处变为最大负值,在方位角90°处变为最大正值,并随着方位角从0°增加到90°而增大。这种方位角依赖性可能是由垂直于平面表面和平行于平面表面横向传播的光的贡献重叠所致。因此,正确预测了诸如延迟、其取向、旋光性和退偏系数等偏振参数对照射点周围方位角和径向距离的依赖性。

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