Sato Hikaru, Hiramatsu Hidenori, Kamiya Toshio, Hosono Hideo
Laboratory for Materials and Structures, Institute of Innovative Research, Tokyo Institute of Technology, Mailbox R3-1, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan.
Materials Research Center for Element Strategy, Tokyo Institute of Technology, Mailbox SE-6, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan.
Sci Rep. 2016 Nov 11;6:36828. doi: 10.1038/srep36828.
Thin films of the iron-based superconductor BaFe(AsP) (Ba122:P) were fabricated on polycrystalline metal-tape substrates with two kinds of in-plane grain boundary alignments (well aligned (4°) and poorly aligned (8°)) by pulsed laser deposition. The poorly aligned substrate is not applicable to cuprate-coated conductors because the in-plane alignment >4° results in exponential decay of the critical current density (J). The Ba122:P film exhibited higher J at 4 K when grown on the poorly aligned substrate than on the well-aligned substrate even though the crystallinity was poorer. It was revealed that the misorientation angles of the poorly aligned samples were less than 6°, which are less than the critical angle of an iron-based superconductor, cobalt-doped BaFeAs (~9°), and the observed strong pinning in the Ba122:P is attributed to the high-density grain boundaries with the misorientation angles smaller than the critical angle. This result reveals a distinct advantage over cuprate-coated conductors because well-aligned metal-tape substrates are not necessary for practical applications of the iron-based superconductors.
通过脉冲激光沉积法,在具有两种面内晶界排列方式(良好排列(4°)和排列不佳(8°))的多晶金属带衬底上制备了铁基超导体BaFe(AsP)(Ba122:P)薄膜。排列不佳的衬底不适用于铜酸盐涂层导体,因为面内排列>4°会导致临界电流密度(J)呈指数衰减。尽管结晶度较差,但Ba122:P薄膜在4K时生长在排列不佳的衬底上时比生长在排列良好的衬底上表现出更高的J。结果表明,排列不佳的样品的取向差角小于6°,小于铁基超导体钴掺杂BaFeAs的临界角(约9°),并且在Ba122:P中观察到的强钉扎归因于取向差角小于临界角的高密度晶界。这一结果揭示了相对于铜酸盐涂层导体的一个明显优势,因为对于铁基超导体的实际应用而言,不需要排列良好的金属带衬底。