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Optical Calibration of a Submicrometer Magnification Standard.

作者信息

Geist Jon, Belzer Barbara, Miller Mary Lou, Roitman Peter

机构信息

National Institute of Standards and Technology, Gaithersburg, MD 20899.

出版信息

J Res Natl Inst Stand Technol. 1992 Mar-Apr;97(2):267-272. doi: 10.6028/jres.097.008.

Abstract

The calibration of a new submicrometer magnification standard for electron microscopes is described. The new standard is based on the width of a thin thermal-oxide film sandwiched between a silicon single-crystal substrate and a polysilicon capping layer. The calibration is based on an ellipsometric measurement of the oxide thickness before the polysilicon layer is deposited on the oxide. The uncertainty in the derivation of a thickness for the layer from the ellipsometric parameters is also derived.

摘要
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/43b3/4914234/04c632abd48b/jresv97n2p267_a1bf1.jpg

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