Geist Jon, Belzer Barbara, Miller Mary Lou, Roitman Peter
National Institute of Standards and Technology, Gaithersburg, MD 20899.
J Res Natl Inst Stand Technol. 1992 Mar-Apr;97(2):267-272. doi: 10.6028/jres.097.008.
The calibration of a new submicrometer magnification standard for electron microscopes is described. The new standard is based on the width of a thin thermal-oxide film sandwiched between a silicon single-crystal substrate and a polysilicon capping layer. The calibration is based on an ellipsometric measurement of the oxide thickness before the polysilicon layer is deposited on the oxide. The uncertainty in the derivation of a thickness for the layer from the ellipsometric parameters is also derived.