放电等离子烧结氮化硅陶瓷的微观结构

Microstructure of Spark Plasma-Sintered Silicon Nitride Ceramics.

作者信息

Lukianova O A, Novikov V Yu, Parkhomenko A A, Sirota V V, Krasilnikov V V

机构信息

Belgorod National Research University, 85, Pobedy Str., 308015, Belgorod, Russia.

Institute of Solid State Physics, Materials Science and Technologies, NAS of Ukraine, Academic str. 1, Kharkov, 61108, Ukraine.

出版信息

Nanoscale Res Lett. 2017 Dec;12(1):293. doi: 10.1186/s11671-017-2067-z. Epub 2017 Apr 24.

DOI:10.1186/s11671-017-2067-z

PMID:28445995

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5403778/

Abstract

The microstructure and phase composition of the high-content AlO-YO-doped spark plasma-sintered silicon nitride were investigated. Fully dense silicon nitride ceramics with a typical α-SiN equiaxed structure with average grain size from 200 to 530 nm, high elastic modulus of 288 GPa, and high hardness of 2038 HV were spark plasma sintered (SPSed) at 1550 °C. Silicon nitride with elongated β-SiN grains, higher hardness of 1800 HV, density of 3.25 g/cm, and Young's modulus 300 GPa SPSed at 1650 °C was also reviewed.

摘要

研究了高含量AlO-YO掺杂的放电等离子烧结氮化硅的微观结构和相组成。在1550℃下通过放电等离子烧结（SPS）制备出了具有典型α-SiN等轴结构、平均晶粒尺寸为200至530nm、高弹性模量288GPa和高硬度2038HV的全致密氮化硅陶瓷。还回顾了在1650℃下通过SPS制备的具有细长β-SiN晶粒、较高硬度1800HV、密度3.25g/cm和杨氏模量300GPa的氮化硅。