Takahashi Toshihito, Gonda Tomoya, Maeda Yoshinobu
Int J Oral Maxillofac Implants. 2017 Jul/Aug;32(4):815-821. doi: 10.11607/jomi.5618.
This study examined the effects of attachments on strain in maxillary implant overdentures supported by two or four implants.
A maxillary edentulous model with implants inserted into anterior, premolar, and molar areas was fabricated, and three types of unsplinted attachments-ball, locator, and magnet-were set on the implants distributed under various conditions. Maxillary experimental dentures were fabricated, and two strain gauges were attached at the anterior midline on the labial and palatal sides. A vertical occlusal load of 98 N was applied and shear strain of the dentures was measured.
On both sides, magnet attachments resulted in the lowest shear strain, while ball attachments resulted in the highest shear strain under most conditions. However, differences in shear strain among the three attachment types were not significant when supported by four implants, especially molar implants.
Shear strain of the maxillary implant overdenture was lowest when using magnet attachments. Magnet attachments mounted on four implants are recommended to prevent denture complications when using maxillary implant overdentures.
本研究探讨了附着体对由两颗或四颗种植体支持的上颌种植覆盖义齿应变的影响。
制作一个在上颌前牙区、前磨牙区和磨牙区植入种植体的无牙颌模型，并在不同分布条件下的种植体上设置三种类型的非夹板式附着体——球帽、Locator和磁性附着体。制作上颌实验性覆盖义齿，并在唇侧和腭侧的前中线处粘贴两个应变片。施加98 N的垂直咬合载荷，并测量义齿的剪切应变。
在两侧，磁性附着体在大多数情况下导致的剪切应变最低，而球帽附着体导致的剪切应变最高。然而，当由四颗种植体（尤其是磨牙种植体）支持时，三种附着体类型之间的剪切应变差异不显著。
使用磁性附着体时，上颌种植覆盖义齿的剪切应变最低。建议在上颌种植覆盖义齿使用时，在四颗种植体上安装磁性附着体以防止义齿并发症。
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