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人工耳蜗电极阵列暴露:一种迟发性并发症。

Cochlear implant electrode array exposure: A delayed complication.

作者信息

Mishu Christina, Klodd David A, Redleaf Miriam

机构信息

Department of Communication Disorders and Sciences, Rush University Medical Center, Chicago, IL, USA.

出版信息

Ear Nose Throat J. 2017 Jul;96(7):E40-E43. doi: 10.1177/014556131709600708.

Abstract

Exposure of the cochlear implant electrode array as a late complication has been reported rarely in the literature. A retrospective analysis revealed 4 patients presenting with exposure of their cochlear implant electrode arrays from 2 to 17 years after implantation. Data collected from these 4 patients were surgical implantation approach, type of implant, age at implant, interval between implant and complication, surgical correction of the problem, pathology at the time of correction, and length of follow-up after intervention. All 4 patients presented with otitis or mastoiditis. Each had undergone a transmastoid approach with facial recess and cochleostomy and full implant insertion. In 3 cases, the tympanic membrane had retracted to expose the electrode array. In 1 patient, the electrode array had eroded through the external canal, lateral to the facial recess. The exposed arrays were addressed surgically, including explantation/reimplantation for 1 patient. Cochlear implant electrode arrays can become exposed by relative migration of the array and the tympanic membrane. Implant surgeons and audiologists need to be aware of the possibility of this complication. Closure of the ear canal appears to be the most effective surgical intervention.

摘要

人工耳蜗电极阵列暴露作为一种晚期并发症在文献中鲜有报道。一项回顾性分析发现,4例患者在植入人工耳蜗2至17年后出现电极阵列暴露。从这4例患者收集的数据包括手术植入方式、植入物类型、植入时年龄、植入与出现并发症的间隔时间、问题的手术矫正情况、矫正时的病理情况以及干预后的随访时长。所有4例患者均出现中耳炎或乳突炎。每例患者均采用经乳突入路,经面神经隐窝和耳蜗造瘘并完全植入电极。3例患者鼓膜内陷致使电极阵列暴露。1例患者电极阵列穿破外耳道,位于面神经隐窝外侧。对暴露的电极阵列进行了手术处理,其中1例患者进行了取出/重新植入。人工耳蜗电极阵列可能因阵列与鼓膜的相对移位而暴露。植入外科医生和听力学家需要意识到这种并发症的可能性。耳道封闭似乎是最有效的手术干预措施。

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