Sakamaki M, Amemiya K
Institute of Materials Structure Science, High Energy Accelerator Research Organization, Tsukuba, Ibaraki 305-0801, Japan.
Rev Sci Instrum. 2017 Aug;88(8):083901. doi: 10.1063/1.4986146.
We develop a fluorescence-yield depth-resolved soft x-ray absorption spectroscopy (XAS) technique, which is based on the principle that the probing depth is changed by the emission angle of the fluorescence soft x rays. Compared with the electron-yield depth-resolved XAS technique, which has been established in this decade, we can observe wider range in-depth XAS distribution up to several tens of nm. Applying this technique to a 30 ML (∼4.3 nm) FeCo thin film, we observe Fe L-edge XAS spectra at the probing depth of 0.3-6 nm and find that the film has 22 ML (∼3.1 nm) surface oxide layer while its inner layer shows metallic state. We thus successfully obtain nanometer-resolution depth-resolved XAS spectra and further expect that operando measurement under the electric and/or magnetic fields is possible.
我们开发了一种荧光产额深度分辨软X射线吸收光谱（XAS）技术，该技术基于荧光软X射线的发射角改变探测深度的原理。与本世纪已建立的电子产额深度分辨XAS技术相比，我们可以观察到高达几十纳米的更宽深度范围内的XAS分布。将该技术应用于30 ML（约4.3 nm）的FeCo薄膜，我们在0.3 - 6 nm的探测深度处观察到Fe L边XAS光谱，发现该薄膜有22 ML（约3.1 nm）的表面氧化层，而其内层呈现金属态。因此，我们成功获得了纳米分辨率的深度分辨XAS光谱，并进一步期望在电场和/或磁场下进行原位测量是可行的。
