Levi Roi, Bar-Sadan Maya, Albu-Yaron Ana, Popovitz-Biro Ronit, Houben Lothar, Prior Yehiam, Tenne Reshef
Materials and Interfaces Department, Weizmann Institute of Science, Rehovot, Israel.
Institute of Solid State Research and Ernst-Ruska Centre for Microscopy and Spectroscopy with Electrons, Research Centre Jülich GmbH, Germany.
Materials (Basel). 2010 Aug 18;3(8):4428-4445. doi: 10.3390/ma3084428.
Numerous examples of closed-cage nanostructures, such as nested fullerene-like nanoparticles and nanotubes, formed by the folding of materials with layered structure are known. These compounds include WS₂, NiCl₂, CdCl₂, Cs₂O, and recently V₂O₅. Layered materials, whose chemical bonds are highly ionic in character, possess relatively stiff layers, which cannot be evenly folded. Thus, stress-relief generally results in faceted nanostructures seamed by edge-defects. V₂O₅, is a metal oxide compound with a layered structure. The study of the seams in nearly perfect inorganic "fullerene-like" hollow V₂O nanoparticles (NIF-V₂O₅) synthesized by pulsed laser ablation (PLA), is discussed in the present work. The relation between the formation mechanism and the seams between facets is examined. The formation mechanism of the NIF-V₂O is discussed in comparison to fullerene-like structures of other layered materials, like IF structures of MoS₂, CdCl₂, and Cs₂O. The criteria for the perfect seaming of such hollow closed structures are highlighted.
已知有许多由具有层状结构的材料折叠形成的封闭笼状纳米结构的例子,例如嵌套的类富勒烯纳米颗粒和纳米管。这些化合物包括WS₂、NiCl₂、CdCl₂、Cs₂O,以及最近发现的V₂O₅。化学键具有高度离子性的层状材料具有相对较硬的层,这些层无法均匀折叠。因此,应力释放通常会导致由边缘缺陷缝合的多面纳米结构。V₂O₅是一种具有层状结构的金属氧化物化合物。本文讨论了通过脉冲激光烧蚀(PLA)合成的近乎完美的无机“类富勒烯”中空V₂O纳米颗粒(NIF-V₂O₅)中的接缝研究。研究了形成机制与小面之间接缝的关系。与其他层状材料的类富勒烯结构(如MoS₂、CdCl₂和Cs₂O的IF结构)相比,讨论了NIF-V₂O的形成机制。强调了这种中空封闭结构完美缝合的标准。