Liu Ling, Onck Patrick R
Micromechanics of Materials, Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands.
Phys Rev Lett. 2017 Aug 4;119(5):057801. doi: 10.1103/PhysRevLett.119.057801. Epub 2017 Jul 31.
Azobenzene-embedded liquid crystal polymers can undergo mechanical deformation in response to ultraviolet (UV) light. The natural rodlike trans state azobenzene absorbs UV light and isomerizes to a bentlike cis state, which disturbs the order of the polymer network, leading to an anisotropic deformation. The current consensus is that the magnitude of the photoinduced deformation is related to the statistical building up of molecules in the cis state. However, a recent experimental study [Liu and Broer, Nat. Commun. 6 8334 (2015).NCAOBW2041-172310.1038/ncomms9334] shows that a drastic (fourfold) increase of the photoinduced deformation can be generated by exposing the samples simultaneously to 365 nm (UV) and 455 nm (visible) light. To elucidate the physical mechanism that drives this increase, we develop a two-light attenuation model and an optomechanical constitutive relation that not only accounts for the statistical accumulation of cis azobenzenes, but also for the dynamic trans-cis-trans oscillatory isomerization process. Our experimentally calibrated model predicts that the optimal single-wavelength exposure is 395 nm light, a pronounced shift towards the visible spectrum. In addition, we identify a range of optimal combinations of two-wavelength lights that generate a favorable response for a given amount of injected energy. Our model provides mechanistic insight into the different (multi)wavelength exposures used in experiments and, at the same time, opens new avenues towards enhanced, multiwavelength optomechanical behavior.
嵌入偶氮苯的液晶聚合物能够响应紫外线(UV)发生机械变形。天然棒状的反式偶氮苯吸收紫外线并异构化为弯曲状的顺式状态,这扰乱了聚合物网络的有序性,导致各向异性变形。目前的共识是,光致变形的幅度与顺式状态下分子的统计积累有关。然而,最近的一项实验研究[Liu和Broer,《自然·通讯》6 8334(2015年)。NCAOBW2041 - 172310.1038/ncomms9334]表明,通过将样品同时暴露于365纳米(紫外线)和455纳米(可见光)下,可以使光致变形急剧(四倍)增加。为了阐明导致这种增加的物理机制,我们开发了一种双光衰减模型和一种光机械本构关系,该关系不仅考虑了顺式偶氮苯的统计积累,还考虑了动态的反式 - 顺式 - 反式振荡异构化过程。我们通过实验校准的模型预测,最佳单波长曝光是395纳米的光,这是向可见光谱的明显偏移。此外,我们确定了一系列双波长光的最佳组合,这些组合对于给定注入能量产生有利响应。我们的模型为实验中使用的不同(多)波长曝光提供了机理见解,同时为增强多波长光机械行为开辟了新途径。