Liang Shih-Wei, Qiu Ren-Zheng, Fang Te-Hua
Department of Mechanical Engineering, National Kaohsiung University of Applied Sciences, Kaohsiung 807, Taiwan.
Beilstein J Nanotechnol. 2017 Nov 1;8:2283-2295. doi: 10.3762/bjnano.8.228. eCollection 2017.
The dynamic nanomechanical characteristics of Cu films with different grain boundaries under nanoindentation and scratch conditions were studied by molecular dynamics (MD) simulations. The type of grain boundary is the main factor in the control of the substrate atoms with respect to the size of dislocations since the existence of the grain boundary itself restricts the movement associated with dislocations. In this work, we analyzed the transverse and vertical grain boundaries for different angles. From the simulation results, it was found that the sample with a transverse grain boundary angle of 20° had a higher barrier effect on the slip band as compared to samples with other angles. Moreover, the nanoindentation results (i.e., indentation on the upper area) of the vertical grain boundary showed that the force was translated along the grain boundary, thereby producing intergranular fractures.
通过分子动力学(MD)模拟研究了不同晶界的铜膜在纳米压痕和划痕条件下的动态纳米力学特性。晶界类型是控制位错尺寸时影响基底原子的主要因素,因为晶界本身的存在限制了与位错相关的运动。在这项工作中,我们分析了不同角度的横向和纵向晶界。从模拟结果发现,与其他角度的样品相比,横向晶界角度为20°的样品对滑移带具有更高的阻挡作用。此外,纵向晶界的纳米压痕结果(即在上方区域的压痕)表明,力沿着晶界传递,从而产生沿晶断裂。