B Subramanian, S Thanka Rajan, Martin P J, Vaithilingam Vijay, Bean Penelope A, Evans Margaret D M, Bendavid A
CSIR-Central Electrochemical Research Institute, Karaikudi 630003, India.
CSIRO Manufacturing Business Unit, Lindfield, Sydney, New South Wales 2070, Australia.
Biointerphases. 2018 May 22;13(4):041002. doi: 10.1116/1.5007805.
Diamond like carbon (DLC) films were deposited onto Ti6Al4V and Si wafer substrates by RF plasma enhanced chemical vapor deposition. The influence of dopants such as fluorine (F), silicon (Si), and nitrogen (N) on composition, structure, and biocompatibility was investigated. Ion scattering spectroscopy analysis revealed the presence of dopant atoms in the outer-most layers of the films. Raman studies showed that the position of the G-band shifts to higher frequencies with the fluorine and nitrogen content in the DLC film, whereas the incorporation of Si into DLC induces a decrease of the position of the G peak. The corrosion behavior was studied in simulated body fluid. A higher charge transfer resistance (R) was observed for the doped DLC films. The indirect cytotoxicity was performed using L929 fibroblast cells. The coated surfaces were hemocompatible when tested with red blood cells. DLC films were noncytotoxic to L929 cells over a 24 h exposure. Saos-2 osteoblast cell response to the doped and undoped DLC coated surfaces was studied in adhesion, proliferation, differentiation, and mineralization assays. The production of calcium and phosphate by cells on doped DLC, particularly, nitrogen doped DLC, was higher than that on undoped DLC.
通过射频等离子体增强化学气相沉积法,在Ti6Al4V和硅片衬底上沉积类金刚石碳(DLC)薄膜。研究了氟(F)、硅(Si)和氮(N)等掺杂剂对薄膜成分、结构和生物相容性的影响。离子散射光谱分析表明,在薄膜的最外层存在掺杂原子。拉曼研究表明,随着DLC薄膜中氟和氮含量的增加,G带的位置向更高频率移动,而将Si掺入DLC会导致G峰位置降低。在模拟体液中研究了其腐蚀行为。观察到掺杂的DLC薄膜具有更高的电荷转移电阻(R)。使用L929成纤维细胞进行间接细胞毒性试验。当用红细胞进行测试时,涂层表面具有血液相容性。在24小时的暴露时间内,DLC薄膜对L929细胞无细胞毒性。在粘附、增殖、分化和矿化试验中研究了Saos-2成骨细胞对掺杂和未掺杂DLC涂层表面的反应。特别是在掺杂的DLC上,尤其是氮掺杂的DLC上,细胞产生的钙和磷高于未掺杂的DLC。