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嵌入六方氮化硼中的亚 10nm 稳定石墨烯量子点。

Sub-10 nm stable graphene quantum dots embedded in hexagonal boron nitride.

机构信息

Institute for Quantum Science and Engineering and Department of Physics, Southern University of Science and Technology, Shenzhen 518055, China.

出版信息

Nanoscale. 2019 Mar 7;11(10):4226-4230. doi: 10.1039/c9nr00412b.

Abstract

Graphene quantum dots (GQDs), a zero-dimensional material system with distinct physical properties, have great potential in the applications of photonics, electronics, photovoltaics, and quantum information. In particular, GQDs are promising candidates for quantum computing. In principle, a sub-10 nm size is required for GQDs to present the intrinsic quantum properties. However, with such an extreme size, GQDs have predominant edges with lots of active dangling bonds and thus are not stable. Satisfying the demands of both quantum size and stability is therefore of great challenge in the design of GQDs. Herein we demonstrate the fabrication of sub-10 nm stable GQD arrays by embedding GQDs into large-bandgap hexagonal boron nitride (h-BN). With this method, the dangling bonds of GQDs were passivated by the surrounding h-BN lattice to ensure high stability, meanwhile maintaining their intrinsic quantum properties. The sub-10 nm nanopore array was first milled in h-BN using an advanced high-resolution helium ion microscope and then GQDs were directly grown in them through the chemical vapour deposition process. Stability analysis proved that the embedded GQDs show negligible property decay after baking at 100 °C in air for 100 days. The success in preparing sub-10 nm stable GQD arrays will promote the physical exploration and potential applications of this unique zero-dimensional in-plane quantum material.

摘要

石墨烯量子点(GQDs)是一种具有独特物理性质的零维材料体系,在光子学、电子学、光伏和量子信息等应用领域具有巨大的潜力。特别是,GQDs 是量子计算的有前途的候选者。原则上,GQDs 需要小于 10nm 的尺寸才能呈现出本征量子性质。然而,如此极端的尺寸使得 GQDs 具有大量的活跃悬空键,从而不稳定。因此,在 GQDs 的设计中,满足量子尺寸和稳定性的要求是一个巨大的挑战。在此,我们通过将 GQDs 嵌入到大带隙六方氮化硼(h-BN)中来展示制备小于 10nm 的稳定 GQD 阵列的方法。通过这种方法,GQDs 的悬空键被周围的 h-BN 晶格钝化,以确保高稳定性,同时保持其本征量子性质。首先,使用先进的高分辨率氦离子显微镜在 h-BN 中刻蚀小于 10nm 的纳米孔阵列,然后通过化学气相沉积工艺直接在其中生长 GQDs。稳定性分析证明,在空气中 100°C 烘烤 100 天后,嵌入的 GQDs 几乎没有性能衰减。成功制备小于 10nm 的稳定 GQD 阵列将促进对这种独特的平面内零维量子材料的物理探索和潜在应用。

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