Song Yanxing, Chai Changchun, Fan Qingyang, Zhang Wei, Yang Yintang
State Key Discipline Laboratory of Wide BandGap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, People's Republic of China.
J Phys Condens Matter. 2019 Jun 26;31(25):255703. doi: 10.1088/1361-648X/ab11a2. Epub 2019 Mar 20.
A new phase of C2/m Ge is first proposed in this paper. The structures and mechanical, anisotropic, electronic, transport and optical properties of Si-Ge alloys in the C2/m phase are studied using first principles calculations. All Ge and Si Ge alloys in the C2/m phase are proven to have mechanical and dynamic stability. By analyzing the three-dimensional (3D) perspective of the effective mass and Young's modulus, obvious anisotropies of transport and mechanical properties are found. Higher-resolution full band structures are obtained to determine the positions of the valence band maximum (VBM) and conduction band minimum (CBM). All materials have a higher photoelectron absorption than that of diamond Si. A high electronic mobility (16 527 cm V s) and hole mobility (3033 cm V s) are found in C2/m SiGe and SiGe, respectively. Based on the large mobility and photoelectron absorption, the Si-Ge alloys in the C2/m phase are promising materials for electronics and optoelectronics applications.
本文首次提出了C2/m相的Ge的新阶段。利用第一性原理计算研究了C2/m相Si-Ge合金的结构、力学、各向异性、电子、输运和光学性质。结果表明,C2/m相中的所有Ge和Si-Ge合金都具有力学和动力学稳定性。通过分析有效质量和杨氏模量的三维视角,发现了输运和力学性质的明显各向异性。获得了更高分辨率的全带结构,以确定价带最大值(VBM)和导带最小值(CBM)的位置。所有材料的光电子吸收都高于金刚石Si。在C2/m SiGe和SiGe中分别发现了高电子迁移率(16 527 cm V s)和空穴迁移率(3033 cm V s)。基于大迁移率和光电子吸收,C2/m相的Si-Ge合金是电子和光电子应用的有前途的材料。