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在InGaAs双层电子系统中观察到的分数量子霍尔效应作为“指纹”。

Fractional quantum Hall effects in InGaAs bilayer electron systems observed as "Finger print".

作者信息

Yamada Syoji, Fujimoto Akira, Hidaka Siro, Akabori Masashi, Imanaka Yasutaka, Takehana Kanji

机构信息

Osaka Institute of Technology, 5-16-1, Omiya, Asahi-ku Osaka, 535-8585, Japan.

LT Center, Osaka University, 1-1, Machikaneyama, Toyonaka, Osaka, 560-0043, Japan.

出版信息

Sci Rep. 2019 May 15;9(1):7446. doi: 10.1038/s41598-019-43290-8.

Abstract

Observations of fractional quantum Hall (FQH) plateaus are reported in bilayer electron gas system in wide (>80 nm) InGaAs wells. Several q/p (p = 5, 3, and 2, q > 5) QH states are confirmed at high temperatures (~1.6 K) when the critical conditions including an electron density imbalance as well as a dynamical resistance behavior at the bilayer-monolayer transition are properly satisfied. The former leads to a quantum limit in either of the layers and the latter might bring a meta-stable nature into FQH phenomena. Such a behavior occurs as a probability process associating with impurities or defects in the wells, they inevitably reflect the local structural landscapes of each sample. This is verified by the new finding that the kinds of fractional plateaus (what set of fractional filling factors) appeared are different depending on the samples, that is, they are the "finger print" in each sample.

摘要

在宽(>80nm)的InGaAs阱中的双层电子气系统中报道了分数量子霍尔(FQH)平台的观测结果。当包括电子密度不平衡以及双层-单层转变时的动态电阻行为等临界条件得到适当满足时,在高温(~1.6K)下确认了几个q/p(p = 5、3和2,q > 5)量子霍尔态。前者导致其中一层出现量子极限,而后者可能使FQH现象具有亚稳性质。这种行为作为与阱中的杂质或缺陷相关的概率过程发生,它们不可避免地反映了每个样品的局部结构特征。这通过新的发现得到验证,即出现的分数量子平台种类(分数填充因子的集合)因样品而异,也就是说,它们是每个样品中的“指纹”。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8f1d/6520355/6eaac54791e0/41598_2019_43290_Fig1_HTML.jpg

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