Yu Zhiwei, Song Aisheng, Sun Luzhao, Li Yanglizhi, Gao Lei, Peng Hailin, Ma Tianbao, Liu Zhongfan, Luo Jianbin
State Key Laboratory of Tribology, Tsinghua University, Beijing, 100084, China.
Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China.
Small. 2020 Apr;16(15):e1902844. doi: 10.1002/smll.201902844. Epub 2019 Sep 6.
Bilayer or few-layer 2D materials showing novel electrical properties in electronic device applications have aroused increasing interest in recent years. Obtaining a comprehensive understanding of interlayer contact conductance still remains a challenge, but is significant for improving the performance of bilayer or few-layer 2D electronic devices. Here, conductive atomic force microscope (C-AFM) experiments are reported to explore the interlayer contact conductance between bilayer graphene (BLG) with various twisted stacking structures fabricated by the chemical vapor deposition (CVD) method. The current maps show that the interlayer contact conductance between BLG strongly depends on the twist angle. The interlayer contact conductance of 0° AB-stacking bilayer graphene (AB-BLG) is ≈4 times as large as that of 30° twisted bilayer graphene (t-BLG), which indicates that the twist angle-dependent interlayer contact conductance originates from the coupling-decoupling transitions. Moreover, the moiré superlattice-level current images of t-BLG show modulations of local interlayer contact conductance. Density functional theory calculations together with a theoretical model reproduce the C-AFM current map and show that the modulation is mainly attributed to the overall contribution of local interfacial carrier density and tunneling barrier.
近年来,在电子器件应用中展现出新颖电学特性的双层或少层二维材料引起了越来越多的关注。全面了解层间接触电导仍然是一项挑战,但对于提高双层或少层二维电子器件的性能具有重要意义。在此,报道了利用导电原子力显微镜(C-AFM)实验来探究通过化学气相沉积(CVD)方法制备的具有各种扭曲堆叠结构的双层石墨烯(BLG)之间的层间接触电导。电流图表明,BLG之间的层间接触电导强烈依赖于扭曲角。0° AB堆叠双层石墨烯(AB-BLG)的层间接触电导约为30°扭曲双层石墨烯(t-BLG)的4倍,这表明扭曲角依赖的层间接触电导源于耦合-解耦转变。此外,t-BLG的莫尔超晶格级电流图像显示了局部层间接触电导的调制。密度泛函理论计算与理论模型再现了C-AFM电流图,并表明这种调制主要归因于局部界面载流子密度和隧穿势垒的总体贡献。