Singh Abhay Pratap, Roccapriore Kevin, Algarni Zaina, Salloom Riyadh, Golden Teresa D, Philipose U
Department of Physics, University of North Texas, Denton, TX 76203, USA.
Oak Ridge National Lab. (ORNL), Oak Ridge, TN 37830, USA.
Nanomaterials (Basel). 2019 Sep 5;9(9):1260. doi: 10.3390/nano9091260.
A dense array of vertically aligned indium antimonide (InSb) nanowires with high aspect ratio (diameter 150 nm, length 20 μ m) were grown in the pores of a track-etched polycarbonate membrane via a one-step electrochemical method. There are several reports on InSb nanowire growth in the pores of a mechanically rigid, nano-channel alumina template (NCA), where nanowire growth occurs in the pores of the NCA. This work on InSb nanowire growth in pores of track-etched polycarbonate (PC) membrane sheds light on the various factors that affect nucleation and nanowire growth. The average length and diameter of the as-grown nanowires was about 10 μ m and 150 nm, respectively. Two possible mechanisms accounting for two different morphologies of the as-grown nanowires are proposed. The polycrystallinity observed in some of the nanowires is explained using the 3D 'nucleation-coalescence' mechanism. On the other hand, single crystal nanowires with a high density of twin defects and stacking faults grow epitaxially by a two-dimensional (2D) nucleation/growth mechanism. To assess the electrical quality of the nanowires, two- and four-terminal devices were fabricated using a single InSb nanowire contacted by two Ni electrodes. It was found that, at low bias, the ohmic current is controlled by charge diffusion from the bulk contacts. On the other hand, at high bias, the effects of space charge limited current (SCLC) are evident in the current-voltage behavior, characteristic of transport through structures with reduced electrostatic screening. A cross-over from ohmic to SCLC occurs at about 0.14 V, yielding a free carrier concentration of the order of 10 14 cm - 3 .
通过一步电化学方法,在径迹蚀刻聚碳酸酯膜的孔中生长出了具有高纵横比(直径150纳米,长度20微米)的密集排列的垂直对齐锑化铟(InSb)纳米线阵列。关于在机械刚性的纳米通道氧化铝模板(NCA)的孔中生长InSb纳米线已有多篇报道,纳米线在NCA的孔中生长。这项关于在径迹蚀刻聚碳酸酯(PC)膜孔中生长InSb纳米线的工作揭示了影响成核和纳米线生长的各种因素。生长的纳米线的平均长度和直径分别约为10微米和150纳米。提出了两种可能的机制来解释生长的纳米线的两种不同形态。利用3D“成核-聚结”机制解释了在一些纳米线中观察到的多晶性。另一方面,具有高密度孪晶缺陷和堆垛层错的单晶纳米线通过二维(2D)成核/生长机制外延生长。为了评估纳米线的电学质量,使用单个InSb纳米线与两个Ni电极接触制作了二端和四端器件。结果发现,在低偏压下,欧姆电流由来自体接触的电荷扩散控制。另一方面,在高偏压下,空间电荷限制电流(SCLC)的影响在电流-电压行为中很明显,这是通过具有降低静电屏蔽的结构传输的特征。在约0.14 V时发生从欧姆到SCLC的转变,产生的自由载流子浓度约为10^14 cm^-3 。