Zhu Ting, Wu Tiesheng, Liu Yumin, Liu Chang, Li Jing, Wang Yu, Yu Zhongyuan, Yu Li, Ye Han
Appl Opt. 2019 Sep 1;58(25):6742-6749. doi: 10.1364/AO.58.006742.
We propose high-index truncated cone silicon metasurfaces based mainly on magnetic Mie resonances. From numerical simulation, the intensity of the reflection peak reaches almost 90%, and the full width at half-maximum (FWHM) of the reflectance spectrum is 43 nm. Specific colors covering the entire visible spectrum with saturation close to 1 are available by selecting appropriate geometric dimensions and period of the structure. In summary, the structural colors achieved by the proposed metasurfaces are superior to previous research in comprehensive aspects of reflection peak, the FWHM of the reflectance spectrum, and the saturation of the color. Furthermore, the proposed structure works with a low aspect ratio of 0.46, which largely relieves the difficulty of process manufacturing.
我们提出了主要基于磁米氏共振的高折射率截断圆锥硅超表面。通过数值模拟可知,反射峰强度几乎达到90%,反射光谱的半高宽(FWHM)为43nm。通过选择合适的结构几何尺寸和周期,可以获得覆盖整个可见光谱且饱和度接近1的特定颜色。总之,所提出的超表面实现的结构色在反射峰、反射光谱的半高宽和颜色饱和度等综合方面优于先前的研究。此外,所提出的结构以0.46的低纵横比工作,这在很大程度上缓解了工艺制造的难度。