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介孔 ZnO 薄膜由分子层沉积的“锌酮”获得。

Mesoporous ZnO thin films obtained from molecular layer deposited "zincones".

机构信息

Institute of Solid State Physics, NAWI Graz, Graz University of Technology, Petersgasse 16, 8010 Graz, Austria.

出版信息

Dalton Trans. 2019 Oct 7;48(37):14178-14188. doi: 10.1039/c9dt02824b. Epub 2019 Sep 11.

Abstract

The delivery of porous ZnO thin films represents a challenge due to the low porosity achievable by conventional thin film deposition methods. In this contribution, the synthesis of mesoporous ZnO thin films is demonstrated through calcination in air of hybrid Zn-based polymers (zincone) obtained by molecular layer deposition (MLD). The calcination process was followed as a function of temperature using X-ray reflectivity and diffraction, together with spectroscopic ellipsometry. Temperature ranges were identified for the removal of the organic ligands (120 °C) and ZnO crystallization (340 °C). The total porosity and open porosity were also determined by ellipsometric porosimetry (EP) and grazing incidence small-angle X-ray scattering (GISAXS). The calcination temperature was identified as a control parameter for obtaining different (open) porosity contents and pore size distributions (PSDs). Open porosity values of 12.6% and 19.6% were obtained by calcining the zincones up to 600 °C and 400 °C, respectively. Open PSDs with a mean value of 3.2 nm (400 °C) and 4.6 nm (600 °C) were obtained. The formation of larger slit-shaped pores was demonstrated at higher temperatures, due to the growth and coalescence of ZnO crystallites.

摘要

多孔氧化锌薄膜的制备是一个挑战,因为传统的薄膜沉积方法所能达到的孔隙率较低。在本研究中,通过分子层沉积(MLD)获得的锌基聚合物(锌酮)在空气中的煅烧来制备中孔 ZnO 薄膜。使用 X 射线反射率和衍射以及光谱椭圆光度法来研究煅烧过程随温度的变化。确定了去除有机配体(120°C)和 ZnO 结晶(340°C)的温度范围。还通过椭圆光度法(EP)和掠入射小角 X 射线散射(GISAXS)确定了总孔隙率和开式孔隙率。煅烧温度被确定为获得不同(开式)孔隙率含量和孔径分布(PSD)的控制参数。将 zincon 分别煅烧至 600°C 和 400°C,可获得 12.6%和 19.6%的开式孔隙率。通过计算得出,分别在 400°C 和 600°C 下煅烧的开式 PSD 的平均值为 3.2nm 和 4.6nm。由于 ZnO 晶须的生长和合并,在较高温度下形成了更大的狭缝状孔。

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