ACS Appl Mater Interfaces. 2019 Dec 4;11(48):45199-45206. doi: 10.1021/acsami.9b15528. Epub 2019 Nov 20.
Silicon integration of nanoscale metamaterials is a crucial step toward low-cost and scalable optical-based integrated circuits. Here, a self-assembled epitaxial Au-BaTiO (Au-BTO) hybrid metamaterial with highly anisotropic optical properties has been integrated on Si substrates. A thin buffer layer stack (<20 nm) of TiN and SrTiO (STO) was applied on Si substrates to ensure the epitaxial growth of the Au-BTO hybrid films. Detailed phase composition and microstructural analyses show excellent crystallinity and epitaxial quality of the Au-BTO films. By varying the film growth conditions, the density and dimension of the Au nanopillars can be tuned effectively, leading to highly tailorable optical properties including tunable localized surface plasmon resonance (LSPR) peak and hyperbolic dispersion shift in the visible and near-infrared regimes. The work highlights the feasibility of integrating epitaxial hybrid oxide-metal plasmonic metamaterials on Si toward future complex Si-based integrated photonics.
硅基纳米级超材料的集成是实现低成本、可扩展的基于光学的集成电路的关键步骤。在这里,我们在 Si 衬底上集成了具有各向异性光学特性的自组装外延 Au-BaTiO3(Au-BTO)混合超材料。在 Si 衬底上施加了一层厚度小于 20nm 的 TiN 和 SrTiO3(STO)的薄缓冲层堆栈,以确保 Au-BTO 混合薄膜的外延生长。详细的相组成和微观结构分析表明 Au-BTO 薄膜具有优异的结晶度和外延质量。通过改变薄膜生长条件,可以有效地调节 Au 纳米柱的密度和尺寸,从而实现高度可调节的光学性质,包括可调谐的局域表面等离子体共振(LSPR)峰和在可见光和近红外区域的双曲色散移动。这项工作突出了在 Si 上集成外延混合氧化物-金属等离子体超材料以实现未来复杂的基于 Si 的集成光子学的可行性。