Shen Feihong, Zheng Yanyan, Miao Lei, Liu Chengyan, Gao Jie, Wang Xiaoyang, Liu Pengfei, Yoshida Kenta, Cai Huanfu
Guangxi Key Laboratory of Information Material, Guangxi Collaborative Innovation Center of Structure and Property for New Energy and Materials, School of Material Science and Engineering , Guilin University of Electronic Technology , Guilin 541004 , China.
Division of Physics, Faculty of Pure and Applied Sciences and Tsukuba Research Center for Energy Materials Science (TREMS) , University of Tsukuba , 1-1-1, Tennodai , Tsukuba, Ibaraki , 305-8571 , Japan.
ACS Appl Mater Interfaces. 2020 Feb 19;12(7):8385-8391. doi: 10.1021/acsami.9b18078. Epub 2020 Feb 11.
At present, copper sulfide materials have been predicted as promising thermoelectric materials due to their inexpensiveness and nontoxicity property. Most researches on copper sulfide are focused on CuS and CuS because they are more easily synthesized into a single phase; however, the improper electrical conductivity greatly hindered their thermoelectric properties. In this work, a series of high-performance CuNiS ( = 0, 0.01, 0.015, and 0.02) bulk samples were fabricated by accurately manipulating the ratio of Cu/S with appropriate Ni-doping. The thermoelectric properties of Ni-doped CuS were explored in detail for the first time. It can be found that carrier thermal conductivity and lattice thermal conductivity of CuNiS were effectively reduced via Ni-doping, simultaneously, without the great influence on the power factor. Here, the carrier thermal conductivity (κ) was reduced due to the extreme reduction of Hall carrier concentration. In addition, amounts of nanopores introduced by Ni-doping and complex crystal structure from the phase transition of the second phase strengthen the phonon scattering and reduce lattice thermal conductivity (κ) remarkably. As a consequence, the lowest carrier thermal conductivity and lattice thermal conductivity reach 0.006 and 1.08 W m K for CuNiS at 773 K, and the average ZT is about 0.39 from 323 to 773 K (the ZT is about 0.9 at 773 K). This work demonstrates that low-cost and easily fabricated Ni-doped CuS is a pleasurable candidate for thermoelectric application despite it usually being treated as an ion conductor.
目前,硫化铜材料因其价格低廉和无毒的特性而被预测为有前景的热电材料。大多数关于硫化铜的研究都集中在CuS和Cu₂S上,因为它们更容易合成单相;然而,不合适的电导率极大地阻碍了它们的热电性能。在这项工作中,通过精确控制Cu/S比例并进行适当的Ni掺杂,制备了一系列高性能的CuNiSₓ(x = 0、0.01、0.015和0.02)块状样品。首次详细研究了Ni掺杂Cu₂S的热电性能。可以发现,通过Ni掺杂有效地降低了CuNiSₓ的载流子热导率和晶格热导率,同时,对功率因子没有太大影响。在此,由于霍尔载流子浓度的极大降低,载流子热导率(κₑ)降低。此外,Ni掺杂引入的大量纳米孔和第二相相变产生的复杂晶体结构增强了声子散射,显著降低了晶格热导率(κₗ)。结果,在773 K时,CuNiSₓ的最低载流子热导率和晶格热导率分别达到0.006和1.08 W m⁻¹ K⁻¹,并且在323至773 K范围内平均ZT约为0.39(在773 K时ZT约为0.9)。这项工作表明,低成本且易于制备的Ni掺杂Cu₂S尽管通常被视为离子导体,但却是热电应用的理想候选材料。