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通过等离子体驱动的硫族元素缺陷工程实现晶圆级二维PtSe层中与厚度无关的半导体到金属的转变。

Thickness-Independent Semiconducting-to-Metallic Conversion in Wafer-Scale Two-Dimensional PtSe Layers by Plasma-Driven Chalcogen Defect Engineering.

作者信息

Shawkat Mashiyat Sumaiya, Gil Jaeyoung, Han Sang Sub, Ko Tae-Jun, Wang Mengjing, Dev Durjoy, Kwon Junyoung, Lee Gwan-Hyoung, Oh Kyu Hwan, Chung Hee-Suk, Roy Tania, Jung YounJoon, Jung Yeonwoong

机构信息

NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States.

Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida 32816, United States.

出版信息

ACS Appl Mater Interfaces. 2020 Mar 25;12(12):14341-14351. doi: 10.1021/acsami.0c00116. Epub 2020 Mar 11.

Abstract

Platinum diselenide (PtSe) is an emerging class of two-dimensional (2D) transition-metal dichalcogenide (TMD) crystals recently gaining substantial interest, owing to its extraordinary properties absent in conventional 2D TMD layers. Most interestingly, it exhibits a thickness-dependent semiconducting-to-metallic transition, i.e., thick 2D PtSe layers, which are intrinsically metallic, become semiconducting with their thickness reduced below a certain point. Realizing both semiconducting and metallic phases within identical 2D PtSe layers in a spatially well-controlled manner offers unprecedented opportunities toward atomically thin tailored electronic junctions, unattainable with conventional materials. In this study, beyond this thickness-dependent intrinsic semiconducting-to-metallic transition of 2D PtSe layers, we demonstrate that controlled plasma irradiation can "externally" achieve such tunable carrier transports. We grew wafer-scale very thin (a few nm) 2D PtSe layers by a chemical vapor deposition (CVD) method and confirmed their intrinsic semiconducting properties. We then irradiated the material with argon (Ar) plasma, which was intended to make it more semiconducting by thickness reduction. Surprisingly, we discovered a reversed transition of semiconducting to metallic, which is opposite to the prediction concerning their intrinsic thickness-dependent carrier transports. Through extensive structural and chemical characterization, we identified that the plasma irradiation introduces a large concentration of near-atomic defects and selenium (Se) vacancies in initially stoichiometric 2D PtSe layers. Furthermore, we performed density functional theory (DFT) calculations and clarified that the band-gap energy of such defective 2D PtSe layers gradually decreases with increasing defect concentration and dimensions, accompanying a large number of midgap energy states. This corroborative experimental and theoretical study decisively verifies the fundamental mechanism for this externally controlled semiconducting-to-metallic transition in large-area CVD-grown 2D PtSe layers, greatly broadening their versatility for futuristic electronics.

摘要

二硒化铂(PtSe₂)是一类新兴的二维(2D)过渡金属二硫属化物(TMD)晶体,由于其具有传统二维TMD层所没有的非凡特性,最近引起了人们的广泛关注。最有趣的是,它表现出厚度依赖的半导体到金属的转变,即,本征为金属的厚二维PtSe₂层,当其厚度减小到某一点以下时会变成半导体。以空间可控的方式在相同的二维PtSe₂层中实现半导体和金属相,为原子级薄的定制电子结提供了前所未有的机会,这是传统材料无法实现的。在这项研究中,除了二维PtSe₂层这种厚度依赖的本征半导体到金属的转变之外,我们还证明了可控的等离子体辐照可以“外部”实现这种可调谐的载流子传输。我们通过化学气相沉积(CVD)方法生长了晶圆级的非常薄(几纳米)的二维PtSe₂层,并证实了它们的本征半导体特性。然后我们用氩(Ar)等离子体辐照该材料,目的是通过减小厚度使其更具半导体性。令人惊讶的是,我们发现了半导体到金属的反向转变,这与关于其本征厚度依赖的载流子传输的预测相反。通过广泛的结构和化学表征,我们确定等离子体辐照在初始化学计量比的二维PtSe₂层中引入了大量近原子缺陷和硒(Se)空位。此外,我们进行了密度泛函理论(DFT)计算,并阐明了这种有缺陷的二维PtSe₂层的带隙能量随着缺陷浓度和尺寸的增加而逐渐降低,同时伴随着大量的带隙中能量状态。这项相互印证的实验和理论研究决定性地验证了大面积CVD生长的二维PtSe₂层中这种外部控制的半导体到金属转变的基本机制,极大地拓宽了它们在未来电子学中的应用范围。

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