Wang Hao, Wang Hongtao, Zhang Wang, Yang Joel K W
Engineering Product Development Pillar, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487372, Singapore.
Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, #08-03 Innovis, Singapore 138634, Singapore.
ACS Nano. 2020 Aug 25;14(8):10452-10461. doi: 10.1021/acsnano.0c04313. Epub 2020 Jul 24.
Diffractive optical elements (DOEs) are widely applied as compact solutions to generate desired optical patterns in the far field by wavefront shaping. They consist of microscopic structures of varying heights to control the phase of either reflected or transmitted light. However, traditional methods to achieve varying thicknesses of structures for DOEs are tedious, requiring multiple aligned lithographic steps each followed by an etching process. Additionally, the reliance on photomasks precludes rapid prototyping and customization in manufacturing complex and multifunctional surface profiles. To achieve this, we turn to nanoscale 3D printing based on two-photon polymerization lithography (TPL). However, TPL systems lack the precision to pattern diffractive components where subwavelength variations in height and position could lead to observable loss in diffraction efficiency. Here, we employed a lumped TPL parametric model and a workaround patterning strategy to achieve precise 3D printing of DOEs using optimized parameters for laser power, beam scan speed, hatching distance, and slicing distance. In our case study, millimeter scale near-perfect Dammann gratings were fabricated with measured diffraction efficiencies near theoretical limits, laser spot array nonuniformity as low as 1.4%, and power ratio of the zero-order spot as low as 0.4%. Leveraging on the advantages of additive manufacturing inherent to TPL, the 3D-printed optical devices can be applied for precise wavefront shaping, with great potential in all-optical machine learning, virtual reality, motion sensing, and medical imaging.
衍射光学元件(DOEs)作为一种紧凑的解决方案被广泛应用,通过波前整形在远场中产生所需的光学图案。它们由高度不同的微观结构组成,以控制反射光或透射光的相位。然而,传统的实现DOEs结构不同厚度的方法很繁琐,需要多个对齐的光刻步骤,每个步骤之后都要进行蚀刻工艺。此外,对光掩模的依赖排除了在制造复杂和多功能表面轮廓时的快速原型制作和定制。为了实现这一点,我们转向基于双光子聚合光刻(TPL)的纳米级3D打印。然而,TPL系统缺乏对衍射组件进行图案化的精度,其中高度和位置的亚波长变化可能导致衍射效率的明显损失。在这里,我们采用了一个集总TPL参数模型和一种变通的图案化策略,通过优化激光功率、光束扫描速度、填充距离和切片距离等参数,实现了DOEs的精确3D打印。在我们的案例研究中,制造出了毫米级的近乎完美的达曼光栅,其测量的衍射效率接近理论极限,激光光斑阵列不均匀性低至1.4%,零级光斑的功率比低至0.4%。利用TPL固有的增材制造优势,3D打印的光学器件可用于精确的波前整形,在全光机器学习、虚拟现实、运动传感和医学成像方面具有巨大潜力。