Ushijima Eizo, Fujimoto Satoshi, Nakazato Kazuo
R&D Department, Aisin Cosmos R&D Co., Ltd., Kariya 448-8650, Japan.
Design and Development Department, MEMS CORE CO., Ltd., Sendai 981-3206, Japan.
ACS Omega. 2020 Aug 31;5(36):23157-23163. doi: 10.1021/acsomega.0c02933. eCollection 2020 Sep 15.
In this study, we attempted to expand the applicability of the mechanism for arranging diamagnetic particles in a modulated magnetic field. A Halbach array magnet was prototyped as a portable device for generating a high magnetic field. Despite the magnet being palm-size with dimensions of 50 × 50 × 20 mm, the magnetic field is 1.31 T at 1 mm from the surface. Additionally, an Si substrate on which an Fe thin film is formed and patterned to be compatible with the integrated circuit (IC)-utilizing the microelectromechanical systems process technology-is prototyped as a tool to generate a modulated magnetic field. Regarding the deposition condition of the Fe thin film, holes with diameters of 30 μm are arranged in an array at intervals of 60 μm, and the thickness is approximately 0.5 μm. Finally, a particle magnetic-adsorption experiment was conducted using the prototypes. The diamagnetic particles (diameter: 25 μm) dispersed in the paramagnetic surrounding medium were observed to be arranged in the hole portions. This result indicates that the microparticles are absorbed in their arbitrary positions by the modulated magnetic field. In the end, we succeeded in achieving the portability and implementation on IC for the particle arrangement magnetic mechanism.
在本研究中,我们试图扩大在调制磁场中排列抗磁性粒子机制的适用性。制作了一个哈尔巴赫阵列磁体作为产生强磁场的便携式设备。尽管该磁体尺寸为50×50×20毫米,手掌大小,但在距表面1毫米处的磁场强度为1.31特斯拉。此外,制作了一个硅基板,在其上利用微机电系统工艺技术形成并图案化铁薄膜,使其与集成电路(IC)兼容,作为产生调制磁场的工具。关于铁薄膜的沉积条件,直径为30μm的孔以60μm的间隔排列成阵列,厚度约为0.5μm。最后,使用这些原型进行了粒子磁吸附实验。观察到分散在顺磁性周围介质中的抗磁性粒子(直径:25μm)排列在孔部分。该结果表明,微粒被调制磁场吸附在其任意位置。最终,我们成功实现了粒子排列磁机制的便携性和在集成电路上的实现。