Pal Dhritabrata, Agrawal Sumit Kumar, Chakraborty Amrita, Chakraborty Shamik
Department of Chemistry, Birla Institute of Technology and Science, Vidya Vihar, Pilani, Rajasthan - 333031, India.
Phys Chem Chem Phys. 2020 Oct 15;22(39):22465-22476. doi: 10.1039/d0cp03855e.
Methanol (CH3OH) is the simplest alcohol and carbon tetrachloride (CCl4) is widely used as a solvent in the chemical industry. CH3OH and CCl4 are both important volatile substances in the atmosphere and CCl4 is an important precursor for atmospheric ozone depletion. Moreover, mixtures of CH3OH and CCl4 are an important class of non-aqueous mixtures as they exhibit a large deviation from Raoult's law. The specific interaction between CH3OH and CCl4 is not yet investigated experimentally. The interaction between CH3OH and CCl4 at the molecular level can be twofold: hydrogen bond (O-HCl) and halogen bond (C-ClO) interaction. One halogen bonded minimum and two hydrogen bonded minima are identified in the dimer potential energy surface. Herein, the 1 : 1 complex of [CH3OH-CCl4] has been characterised using matrix-isolation infrared spectroscopy and electronic structure calculations to investigate the competition between hydrogen bonded and halogen bonded complexes. Vibrational spectra have been monitored in the C-Cl, C-O, and O-H stretching regions. The exclusive formation of halogen bonded 1 : 1 complexes in argon and nitrogen matrices is confirmed by a combination of experimental and simulated vibrational frequency, stabilisation energy, energy decomposition analysis, and natural bond orbital and atoms-in-molecules analyses. This investigation helps to understand the specific interactions in the [CH3OH-CCl4] mixture and also the possibilities of formation of halogen bonded atmospheric complexes that may influence the atmospheric chemical activities, and enhance aerosol formation and deposition of CCl4.
甲醇(CH₃OH)是最简单的醇类,四氯化碳(CCl₄)在化学工业中广泛用作溶剂。CH₃OH和CCl₄都是大气中重要的挥发性物质,且CCl₄是大气臭氧消耗的重要前体。此外,CH₃OH和CCl₄的混合物是一类重要的非水混合物,因为它们表现出与拉乌尔定律有很大偏差。CH₃OH和CCl₄之间的特定相互作用尚未通过实验进行研究。CH₃OH和CCl₄在分子水平上的相互作用可能有两种:氢键(O-H···Cl)和卤键(C-Cl···O)相互作用。在二聚体势能面上确定了一个卤键极小值和两个氢键极小值。在此,利用基质隔离红外光谱和电子结构计算对[CH₃OH-CCl₄]的1:1配合物进行了表征,以研究氢键配合物和卤键配合物之间的竞争。在C-Cl、C-O和O-H伸缩区域监测了振动光谱。通过实验和模拟的振动频率、稳定化能、能量分解分析以及自然键轨道和分子中的原子分析相结合,证实了在氩气和氮气基质中卤键1:1配合物的排他性形成。这项研究有助于理解[CH₃OH-CCl₄]混合物中的特定相互作用,以及形成可能影响大气化学活性、增强气溶胶形成和CCl₄沉积的卤键大气配合物的可能性。