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砷化硼中缺陷调制能带结构的压力依赖行为

Pressure-Dependent Behavior of Defect-Modulated Band Structure in Boron Arsenide.

作者信息

Meng Xianghai, Singh Akash, Juneja Rinkle, Zhang Yanyao, Tian Fei, Ren Zhifeng, Singh Abhishek K, Shi Li, Lin Jung-Fu, Wang Yaguo

机构信息

Department of Mechanical Engineering, The University of Texas at Austin, Austin, TX, 78712, USA.

Materials Research Centre, Indian Institute of Science, Bangalore, 560012, India.

出版信息

Adv Mater. 2020 Nov;32(45):e2001942. doi: 10.1002/adma.202001942. Epub 2020 Oct 5.

Abstract

The recent observation of unusually high thermal conductivity exceeding 1000 W m K in single-crystal boron arsenide (BAs) has led to interest in the potential application of this semiconductor for thermal management. Although both the electron/hole high mobilities have been calculated for BAs, there is a lack of experimental investigation of its electronic properties. Here, a photoluminescence (PL) measurement of single-crystal BAs at different temperatures and pressures is reported. The measurements reveal an indirect bandgap and two donor-acceptor pair (DAP) recombination transitions. Based on first-principles calculations and time-of-flight secondary-ion mass spectrometry results, the two DAP transitions are confirmed to originate from Si and C impurities occupying shallow energy levels in the bandgap. High-pressure PL spectra show that the donor level with respect to the conduction band minimum shrinks with increasing pressure, which affects the release of free carriers from defect states. These findings suggest the possibility of strain engineering of the transport properties of BAs for application in electronic devices.

摘要

最近观察到单晶砷化硼(BAs)具有超过1000 W m⁻¹ K⁻¹的异常高的热导率,这引发了人们对这种半导体在热管理方面潜在应用的兴趣。尽管已经计算出了BAs的电子/空穴高迁移率,但对其电子性质缺乏实验研究。在此,报道了在不同温度和压力下对单晶BAs进行的光致发光(PL)测量。测量结果揭示了一个间接带隙和两个施主-受主对(DAP)复合跃迁。基于第一性原理计算和飞行时间二次离子质谱结果,证实这两个DAP跃迁源自占据带隙中浅能级的Si和C杂质。高压PL光谱表明,相对于导带最小值的施主能级随着压力增加而缩小,这影响了自由载流子从缺陷态的释放。这些发现表明,有可能通过应变工程来调控BAs的输运性质,以应用于电子器件。

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