Ogończyk Dominika, Jankowski Paweł, Garstecki Piotr
Institute of Physical Chemistry, Polish Academy of Sciences, Kasprzaka 44/52, 01-224 Warsaw, Poland.
Polymers (Basel). 2020 Oct 27;12(11):2490. doi: 10.3390/polym12112490.
Here we present a new methodology for chemical polishing of microchannels in polycarbonate (PC). Tuning the time of exposition and the concentration of ammonia, the roughness arising from the micromachining process can be significantly reduced or completely removed while preserving the structure of microchannels. Besides smoothing out the surface, our method modifies the wettability of the surface, rendering it hydrophobic. The method increases the optical transparency of microchannels and eliminates undesired effects in two-phase microfluidic systems, including wetting by aqueous solutions and cross-contamination between aqueous droplets that could otherwise shed satellites via pinning.
在此,我们展示了一种用于聚碳酸酯(PC)微通道化学抛光的新方法。通过调整暴露时间和氨的浓度,可以在保留微通道结构的同时,显著降低或完全消除微加工过程中产生的粗糙度。除了使表面光滑外,我们的方法还改变了表面的润湿性,使其具有疏水性。该方法提高了微通道的光学透明度,并消除了两相微流体系统中的不良影响,包括水溶液的润湿以及水滴之间的交叉污染,否则水滴可能会通过钉扎产生卫星液滴。