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电弧热喷涂工艺制备的不同金属涂层的电磁屏蔽性能

Electromagnetic Shielding Performance of Different Metallic Coatings Deposited by Arc Thermal Spray Process.

作者信息

Jang Jong-Min, Lee Han-Seung, Singh Jitendra Kumar

机构信息

Innovative Durable Building and Infrastructure Research Center, Department of Architectural Engineering, Hanyang University, 1271 Sa3-dong, Sangrok-gu, Ansan 15588, Korea.

Department of Architectural Engineering, Hanyang University, 1271 Sa 3-dong, Sangrok-gu, Ansan 15588, Korea.

出版信息

Materials (Basel). 2020 Dec 17;13(24):5776. doi: 10.3390/ma13245776.

Abstract

Advancement in electronic and communication technologies bring us up to date, but it causes electromagnetic interference (EMI) resulting in failure of building and infrastructure, hospital, military base, nuclear plant, and sensitive electronics. Therefore, it is of the utmost importance to prevent the failure of structures and electronic components from EMI using conducting coating. In the present study, Cu, Cu-Zn, and Cu-Ni coating was deposited in different thicknesses and their morphology, composition, conductivity, and EMI shielding effectiveness are assessed. The scanning electron microscopy (SEM) results show that 100 µm coating possesses severe defects and porosity but once the thickness is increased to 500 µm, the porosity and electrical conductivity is gradually decreased and increased, respectively. Cu-Zn coating exhibited lowest in porosity, dense, and compact morphology. As the thickness of coating is increased, the EMI shielding effectiveness is increased. Moreover, 100 µm Cu-Zn coating shows 80 dB EMI shielding effectiveness at 1 GHz but Cu and Cu-Ni are found to be 68 and 12 dB, respectively. EMI shielding effectiveness results reveal that 100 µm Cu-Zn coating satisfy the minimum requirement for EMI shielding while Cu and Cu-Ni required higher thickness.

摘要

电子和通信技术的进步使我们与时俱进,但它会产生电磁干扰(EMI),导致建筑物和基础设施、医院、军事基地、核电站以及敏感电子设备出现故障。因此,使用导电涂层防止结构和电子元件因电磁干扰而失效至关重要。在本研究中,沉积了不同厚度的铜、铜锌和铜镍涂层,并对它们的形态、成分、导电性和电磁干扰屏蔽效能进行了评估。扫描电子显微镜(SEM)结果表明,100 µm的涂层存在严重缺陷和孔隙率,但一旦厚度增加到500 µm,孔隙率和电导率分别逐渐降低和增加。铜锌涂层的孔隙率最低,形态致密且紧凑。随着涂层厚度的增加,电磁干扰屏蔽效能提高。此外,100 µm的铜锌涂层在1 GHz时显示出80 dB的电磁干扰屏蔽效能,而铜和铜镍涂层分别为68 dB和12 dB。电磁干扰屏蔽效能结果表明,100 µm的铜锌涂层满足电磁干扰屏蔽的最低要求,而铜和铜镍涂层则需要更高的厚度。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0317/7767199/c79470389f9d/materials-13-05776-g001.jpg

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